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CMOS Gate-Stack Scaling ? Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Condition: New.
-
CMOS Gate-Stack Scaling ? Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
£ 29.69
£ 11.98 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketCondition: New. In.
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Cmos Gate-Stack Scaling Materials, Interfaces and Reliability Implications
Language: English
Published by Cambridge University Press CUP, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Condition: New. pp. 194.
-
CMOS Gate-Stack Scaling Materials, Interfaces and Reliability Implications : Volume 1155
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.
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Cmos Gate-stack Scaling Materials, Interfaces and Reliability Implications : Symposium Held April 14-16, 2009, San Francisco, California, U.s.a.
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Condition: New.
-
CMOS Gate-Stack Scaling ? Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Condition: New.
-
CMOS Gate-Stack Scaling ? Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
£ 100.22
£ 11.98 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketCondition: New. In.
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Cmos Gate-stack Scaling Materials, Interfaces and Reliability Implications : Symposium Held April 14-16, 2009, San Francisco, California, U.s.a.
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
£ 100.21
£ 15 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketCondition: New.
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Cmos Gate-stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Seller: Kennys Bookshop and Art Galleries Ltd., Galway, GY, Ireland
Seller rating 5 out of 5 stars
Condition: New. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. Editor(s): Demkov, Alexander A. (Freescale Semiconductor Inc., Austin, Texas); Taylor, Bill; Harris, H. Rusty; Butterbaugh, Jeffery W.; Rachmady, Willy. Series: MRS Proceedings. Num Pages: 194 pages, Illustrations. BIC Classification: TGM. Category: (U) Tertiary Education (US: College). Dimension: 228 x 152 x 13. Weight in Grams: 430. . 2009. Hardback. . . . .
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Cmos Gate-Stack Scaling-- Materials, Interfaces and Reliability Implications
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Condition: New. pp. viii + 179.
-
Cmos Gate-stack Scaling Materials, Interfaces and Reliability Implications: Symposium Held April 14-16, 2009, San Francisco, California, U.s.a.: Vol 1155
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Hardcover. Condition: Brand New. 194 pages. 9.13x6.30x0.79 inches. In Stock.
-
Cmos Gate-stack Scaling Materials, Interfaces and Reliability Implications : Symposium Held April 14-16, 2009, San Francisco, California, U.s.a.
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
£ 132.99
£ 15 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketCondition: As New. Unread book in perfect condition.
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Cmos Gate-stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Condition: New. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. Editor(s): Demkov, Alexander A. (Freescale Semiconductor Inc., Austin, Texas); Taylor, Bill; Harris, H. Rusty; Butterbaugh, Jeffery W.; Rachmady, Willy. Series: MRS Proceedings. Num Pages: 194 pages, Illustrations. BIC Classification: TGM. Category: (U) Tertiary Education (US: College). Dimension: 228 x 152 x 13. Weight in Grams: 430. . 2009. Hardback. . . . . Books ship from the US and Ireland.
-
CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Hardcover. Condition: Like New. Like New. book.
-
Cmos Gate-stack Scaling Materials, Interfaces and Reliability Implications : Symposium Held April 14-16, 2009, San Francisco, California, U.s.a.
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Condition: As New. Unread book in perfect condition.
-
CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications
Language: English
Published by Cambridge University Press, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Buch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.
-
CMOS Gate-Stack Scaling Materials, Interfaces and Reliability Implications: Volume 1155 (Paperback)
Language: English
Published by Cambridge University Press, Cambridge, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Paperback. Condition: new. Paperback. To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This item is printed on demand. Shipping may be from multiple locations in the US or from the UK, depending on stock availability.
-
CMOS Gate-Stack Scaling â" Materials, Interfaces and Reliability Implications: Volume 1155
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Paperback. Condition: Brand New. 1st edition. 194 pages. 9.02x5.98x0.39 inches. In Stock. This item is printed on demand.
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CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Seller: THE SAINT BOOKSTORE, Southport, United Kingdom
Seller rating 5 out of 5 stars
£ 33.48
£ 13.45 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketPaperback / softback. Condition: New. This item is printed on demand. New copy - Usually dispatched within 5-9 working days.
-
Cmos Gate-Stack Scaling Materials, Interfaces and Reliability Implications
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Condition: New. Print on Demand pp. 194.
-
Cmos Gate-Stack Scaling Materials, Interfaces and Reliability Implications
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Condition: New. PRINT ON DEMAND pp. 194.
-
CMOS Gate-Stack Scaling Materials, Interfaces and Reliability Implications: Volume 1155 (Paperback)
Language: English
Published by Cambridge University Press, Cambridge, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Paperback. Condition: new. Paperback. To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This item is printed on demand. Shipping may be from our UK warehouse or from our Australian or US warehouses, depending on stock availability.
-
CMOS Gate-Stack Scaling Materials, Interfaces and Reliability Implications
Language: English
Published by Cambridge University Press, 2012
ISBN 10: 1107408326 ISBN 13: 9781107408326
Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.KlappentextThe MRS Symposium Proceeding series is an internationally recognised reference suitable for research.
-
CMOS Gate-Stack Scaling Materials, Interfaces and Reliability Implications: Volume 1155 (Paperback)
Language: English
Published by Cambridge University Press, Cambridge, 2014
ISBN 10: 1107408326 ISBN 13: 9781107408326
Paperback. Condition: new. Paperback. To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This item is printed on demand. Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability.
-
Cmos Gate-stack Scaling Materials, Interfaces and Reliability Implications: Symposium Held April 14-16, 2009, San Francisco, California, U.s.a.: Vol 1155
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Hardcover. Condition: Brand New. 194 pages. 9.13x6.30x0.79 inches. In Stock. This item is printed on demand.
-
CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Seller: THE SAINT BOOKSTORE, Southport, United Kingdom
Seller rating 5 out of 5 stars
£ 113.91
£ 14.91 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketHardback. Condition: New. This item is printed on demand. New copy - Usually dispatched within 5-9 working days.
-
Cmos Gate-Stack Scaling-- Materials, Interfaces and Reliability Implications
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Condition: New. Print on Demand pp. viii + 179 Illus.
-
CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications
Language: English
Published by Cambridge University Press, 2016
ISBN 10: 1605111287 ISBN 13: 9781605111285
Gebunden. Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.KlappentextThe MRS Symposium Proceeding series is an internationally recognised reference suitable for research.
-
Cmos Gate-Stack Scaling-- Materials, Interfaces and Reliability Implications
Language: English
Published by Materials Research Society, 2009
ISBN 10: 1605111287 ISBN 13: 9781605111285
Condition: New. PRINT ON DEMAND pp. viii + 179.
-
CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications
Language: English
Published by Cambridge University Press, 2016
ISBN 10: 1605111287 ISBN 13: 9781605111285
Buch. Condition: Neu. CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications | Alexander A. Demkov (u. a.) | Buch | Englisch | 2016 | Cambridge University Press | EAN 9781605111285 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld, gpsr[at]libri[dot]de | Anbieter: preigu Print on Demand.
