CMOS Gate-Stack Scaling Materials, Interfaces and Reliability Implications: Volume 1155 (Paperback)

Language: English

Published by Cambridge University Press, Cambridge, 2014

1107408326 / 9781107408326

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Paperback. To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This item is printed on demand. Shipping may be from our UK warehouse or from our Australian or US warehouses, depending on stock availability.

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Title
CMOS Gate-Stack Scaling Materials, Interfaces and Reliability Implications: Volume 1155 (Paperback)
Author
Alexander A. Demkov
Publisher
Cambridge University Press, Cambridge
Publication year
2014
Condition
new
Binding
Paperback
Language
English
ISBN 10
1107408326
ISBN 13
9781107408326

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