Wang Guilei (55 results)
- Hardcover
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Hardback or Cased Book. Condition: New. Memory Nanomaterials: Growth, Characterization and Device Fabrication. Book.
- Hardcover
Seller: California Books, Miami, FL, U.S.A.California Books
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- Hardcover
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- Hardcover
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- Hardcover
Seller: BargainBookStores, Grand Rapids, MI, U.S.A.BargainBookStores
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Hardback or Cased Book. Condition: New. Silicon Nanodevices. Book.
- Hardcover
Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices
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- Hardcover
Seller: California Books, Miami, FL, U.S.A.California Books
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- Hardcover
Seller: Rarewaves USA, HEBRON, KY, U.S.A.Rarewaves USA
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More images- Hardcover
Seller: Rarewaves.com USA, London, LONDO, United KingdomRarewaves.com USA
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Hardback. Condition: New.
- Hardcover
Seller: GreatBookPricesUK, Woodford Green, United KingdomGreatBookPricesUK
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- Hardcover
Seller: Ria Christie Collections, Uxbridge, United KingdomRia Christie Collections
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£ 55.85
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- Hardcover
Seller: GreatBookPricesUK, Woodford Green, United KingdomGreatBookPricesUK
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- Hardcover
Seller: Rarewaves USA United, HEBRON, KY, U.S.A.Rarewaves USA United
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£ 52.37
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Hardback. Condition: New.
- Hardcover
Seller: Rarewaves USA United, HEBRON, KY, U.S.A.Rarewaves USA United
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£ 60.47
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Hardback. Condition: New.
Language: English
Published by Springer, 2019
- Hardcover
Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices
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£ 107.17
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Published by Springer, 2020
- Softcover
Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices
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Language: English
Published by Springer, 2020
- Softcover
Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices
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£ 114.10
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Language: English
Published by Springer, 2019
- Hardcover
Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices
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Language: English
Published by Springer, 2020
- Softcover
Seller: Ria Christie Collections, Uxbridge, United KingdomRia Christie Collections
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£ 105.17
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Condition: New. In English.
Language: English
Published by Springer, 2019
- Hardcover
Seller: Ria Christie Collections, Uxbridge, United KingdomRia Christie Collections
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£ 106.66
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Language: English
Published by Springer, 2020
- Softcover
Seller: Kennys Bookshop and Art Galleries Ltd., Galway, GY, IrelandKennys Bookshop and Art Galleries Ltd.
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£ 111.83
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Language: English
Published by Springer, 2019
- Hardcover
Seller: Kennys Bookshop and Art Galleries Ltd., Galway, GY, IrelandKennys Bookshop and Art Galleries Ltd.
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£ 113.07
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Condition: New.
More images- Hardcover
Seller: Rarewaves.com UK, London, United KingdomRarewaves.com UK
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£ 56.37
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Hardback. Condition: New.
Language: English
Published by Springer, 2020
- Softcover
Seller: Books Puddle, Woodside, NY, U.S.A.Books Puddle
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£ 129.99
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Condition: New. pp. XVI, 115 1st ed. 2019 edition NO-PA16APR2015-KAP.
Language: English
Published by Springer, 2020
- Softcover
Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH
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£ 108.82
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Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - This thesis presents the SiGe source and drain (S/D) technology in the context of advanced CMOS, and addresses both device processing and epitaxy modelling.As the CMOS technology roadmap calls for continuously downscaling traditional transistor structures, controlling the parasitic effects of transistors, e.g. short channel effect, parasitic resistances and capacitances is becoming increasingly difficult. The emergence of these problems sparked a technological revolution, where a transition from planar to three-dimensional (3D) transistor design occurred in the 22nm technology node.The selective epitaxial growth (SEG) method has been used to deposit SiGe as stressor material in S/D regions to induce uniaxial strain in the channel region. The thesis investigates issues of process integration in IC production and concentrates on the key parameters of high-quality SiGe selective epitaxial growth, with a special focus on its patterndependency behavior and on key integration issues in both 2D and 3D transistor structures, the goal being to improve future applications of SiGe SEG in advanced CMOS.…
Language: English
Published by Springer, 2019
- Hardcover
Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH
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£ 108.82
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Buch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - This thesis presents the SiGe source and drain (S/D) technology in the context of advanced CMOS, and addresses both device processing and epitaxy modelling.As the CMOS technology roadmap calls for continuously downscaling traditional transistor structures, controlling the parasitic effects of transistors, e.g. short channel effect, parasitic resistances and capacitances is becoming increasingly difficult. The emergence of these problems sparked a technological revolution, where a transition from planar to three-dimensional (3D) transistor design occurred in the 22nm technology node.The selective epitaxial growth (SEG) method has been used to deposit SiGe as stressor material in S/D regions to induce uniaxial strain in the channel region. The thesis investigates issues of process integration in IC production and concentrates on the key parameters of high-quality SiGe selective epitaxial growth, with a special focus on its patterndependency behavior and on key integration issues in both 2D and 3D transistor structures, the goal being to improve future applications of SiGe SEG in advanced CMOS.…
Language: English
Published by Springer, 2019
- Hardcover
Seller: Revaluation Books, Exeter, United KingdomRevaluation Books
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£ 129.13
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Hardcover. Condition: Brand New. 132 pages. 9.25x6.10x0.55 inches. In Stock.
Language: English
Published by Springer, 2020
- Softcover
Seller: Kennys Bookstore, Olney, MD, U.S.A.Kennys Bookstore
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£ 140.18
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Condition: New.
Language: English
Published by Springer, 2019
- Hardcover
Seller: Kennys Bookstore, Olney, MD, U.S.A.Kennys Bookstore
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£ 141.60
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Condition: New.
Language: English
Published by Springer, 2020
- Softcover
Seller: Mispah books, Redhill, SURRE, United KingdomMispah books
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£ 154.00
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Paperback. Condition: New. NEW. SHIPS FROM MULTIPLE LOCATIONS. book.
