Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond (Springer Theses)

Language: English

Published by Springer, 2020

9811500487 / 9789811500480

Series: Book 652 of 797 - Springer Theses

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pp. XVI, 115 1st ed. 2019 edition NO-PA16APR2015-KAP.

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Title
Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond (Springer Theses)
Author
Wang, Guilei
Publisher
Springer
Publication year
2020
Condition
New
Binding
Soft cover
Language
English
ISBN 10
9811500487
ISBN 13
9789811500480
Series
Book 652 of 797: Springer Theses

Books Puddle

Woodside, NY, U.S.A.

4-star seller

AbeBooks seller since November 22, 2018

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