Lill Thorsten (24 results)

Condition: acceptable. Fairly worn, but readable and intact. If applicable: Dust jacket, disc or access code may not be included.

PAP. Condition: New. New Book. Shipped from UK. Established seller since 2000.

Condition: New.

Condition: NEW.

Condition: As New. Unread book in perfect condition.

Condition: New.

Paperback. Condition: New.

Condition: New. In.

Paperback. Condition: new. Paperback. Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfacesAn examination of emerging etching technologies, including laser and electron beam assisted etchingA treatment of process control in etching technology and the role played by artificial intelligenceAnalyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject. Shipping may be from multiple locations in the US or from the UK, depending on stock availability.

Condition: As New. Unread book in perfect condition.

Condition: NEW.

Condition: New. 2021. 1st Edition. paperback. . . . . .

Paperback. Condition: New. Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfacesAn examination of emerging etching technologies, including laser and electron beam assisted etchingA treatment of process control in etching technology and the role played by artificial intelligenceAnalyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research and development and academic research allows the book to offer a uniquely multifaceted approach to the subject.

Taschenbuch. Condition: Neu. Neuware -This practical guide, written by an author actively involved in corporate R&D, provides in-depth information on etching technologies that are used in the semiconductor industry, helping engineers to select the right technologies for their task and to design etching processes. 284 pp. Englisch.

Taschenbuch. Condition: Neu. Neuware -This practical guide, written by an author actively involved in corporate R&D, provides in-depth information on etching technologies that are used in the semiconductor industry, helping engineers to select the right technologies for their task and to design etching processes. 284 pp. Englisch.

Condition: New. 2021. 1st Edition. paperback. . . . . . Books ship from the US and Ireland.

Taschenbuch. Condition: Neu. Atomic Layer Processing | Semiconductor Dry Etching Technology | Thorsten Lill | Taschenbuch | XIV | Englisch | 2021 | Wiley-VCH | EAN 9783527346684 | Verantwortliche Person für die EU: Wiley-VCH GmbH, Boschstr. 12, 69469 Weinheim, product-safety[at]wiley[dot]com | Anbieter: preigu.

Paperback. Condition: Brand New. 1st edition. 325 pages. 9.61x6.69x0.65 inches. In Stock.

Taschenbuch. Condition: Neu. Neuware - This practical guide, written by an author actively involved in corporate R&D, provides in-depth information on etching technologies that are used in the semiconductor industry, helping engineers to select the right technologies for their task and to design etching processes.

Paperback. Condition: New. Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfacesAn examination of emerging etching technologies, including laser and electron beam assisted etchingA treatment of process control in etching technology and the role played by artificial intelligenceAnalyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research and development and academic research allows the book to offer a uniquely multifaceted approach to the subject.

Paperback. Condition: new. Paperback. Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfacesAn examination of emerging etching technologies, including laser and electron beam assisted etchingA treatment of process control in etching technology and the role played by artificial intelligenceAnalyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject. Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability.

18 x 25 cm. Unveränderter Nachdruck der Ausgabe Die Kunstdenkmäler von Bayern 1942., 519 S. Goldgeprägte OLwd, Kopffarbschnitt. Reich bebildert, Pläne, mehrfach gefaltete Karte. Aus Raucherhaushalt, Rücken und oberer Schnitt vergilbt/etwas gebräunt, innen gut. Hinweis: Versandkosten müssen bei Auslandsversand evtl. angehoben werden.

Condition: New. PRINT ON DEMAND Book; New; Fast Shipping from the UK. No. book.

Paperback. Condition: Brand New. 1st edition. 325 pages. 9.61x6.69x0.65 inches. In Stock. This item is printed on demand.