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Plasma Etching Fundamentals Applications by Sugawara (9 results)
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Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)
Published by Oxford University Press, 1998
ISBN 10: 019856287X ISBN 13: 9780198562870
Language: English
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
Condition: New. In.
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Plasma Etching : Fundamentals and Applications
Published by Oxford University Press, 1998
ISBN 10: 019856287X ISBN 13: 9780198562870
Language: English
Condition: New.
-
Plasma Etching : Fundamentals and Applications
Published by Oxford University Press, 1998
ISBN 10: 019856287X ISBN 13: 9780198562870
Language: English
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
Condition: New.
-
Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)
Published by Oxford University Press, 1998
ISBN 10: 019856287X ISBN 13: 9780198562870
Language: English
Condition: New.
-
Plasma Etching : Fundamentals and Applications
Published by Oxford University Press, 1998
ISBN 10: 019856287X ISBN 13: 9780198562870
Language: English
Condition: As New. Unread book in perfect condition.
-
Plasma Etching : Fundamentals and Applications
Published by Oxford University Press, 1998
ISBN 10: 019856287X ISBN 13: 9780198562870
Language: English
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
Condition: As New. Unread book in perfect condition.
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Plasma Etching: Fundamentals and Applications (eng)
Published by Oxford University Press, 1998
ISBN 10: 019856287X ISBN 13: 9780198562870
Language: English
Condition: new. Questo è un articolo print on demand.
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Buch. Condition: Neu. Plasma Etching | Fundamentals and Applications | Minoru Sugawara (u. a.) | Buch | Gebunden | Englisch | 1998 | OUP Oxford | EAN 9780198562870 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld, gpsr[at]libri[dot]de | Anbieter: preigu Print on Demand.
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Plasma Etching : Fundamentals and Applications
Published by Oxford University Press, 1998
ISBN 10: 019856287X ISBN 13: 9780198562870
Language: English
Buch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
