Neuware - This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process. Seller Inventory # 9780198562870

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Bibliographic Details

Title: Plasma Etching : Fundamentals and ...

Publisher: Oxford University Press (UK) Jul 1998

Publication Date: 1998

Binding: Buch

Condition: Neu

About this title

Synopsis:

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

About the Author:

Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430

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