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Plasma Etching: Fundamentals and Applications: 7 (Series on Semiconductor Science and Technology) - Hardcover
Synopsis
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
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About the Author
Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430
"About this title" may belong to another edition of this title.
- PublisherOUP Oxford
- Publication date1998
- ISBN 10 019856287X
- ISBN 13 9780198562870
- BindingHardcover
- LanguageEnglish
- Number of pages356
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Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)
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Plasma Etching
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Plasma Etching
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ISBN 13: 9780198562870
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Plasma Etching (Hardcover)
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ISBN 10: 019856287X
ISBN 13: 9780198562870
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Hardcover. Condition: new. Hardcover. The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability. Seller Inventory # 9780198562870
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Plasma Etching : Fundamentals and Applications
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ISBN 10: 019856287X
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Plasma Etching : Fundamentals and Applications
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ISBN 10: 019856287X
ISBN 13: 9780198562870
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Plasma Etching (Hardcover)
Published by
Oxford University Press, Oxford, 1998
ISBN 10: 019856287X
ISBN 13: 9780198562870
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Hardcover. Condition: new. Hardcover. The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. Shipping may be from our UK warehouse or from our Australian or US warehouses, depending on stock availability. Seller Inventory # 9780198562870
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