High Power Impulse Magnetron (16 results)

- Softcover
Seller: Majestic Books, Hounslow, United KingdomMajestic Books
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£ 162.68
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Condition: New. pp. 398.

High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications
Lundin, Daniel (EDT); Minea, Tiberiu (EDT); Gudmundsson, Jon Tomas (EDT)
- Softcover
Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices
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£ 178.74
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Condition: New.

- Softcover
Seller: Books Puddle, New York, NY, U.S.A.Books Puddle
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£ 177.72
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Condition: New. pp. 398.

- Softcover
Seller: Biblios, frankfurt am main, HESSE, GermanyBiblios
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£ 187.12
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Condition: New. pp. 398.

High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications
Lundin, Daniel (EDT); Minea, Tiberiu (EDT); Gudmundsson, Jon Tomas (EDT)
- Softcover
Seller: GreatBookPricesUK, Woodford Green, United KingdomGreatBookPricesUK
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£ 183.52
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Condition: New.
More images- Softcover
Seller: preigu, Osnabrück, Germanypreigu
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£ 148.12
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Taschenbuch. Condition: Neu. High Power Impulse Magnetron Sputtering | Fundamentals, Technologies, Challenges and Applications | Daniel Lundin (u. a.) | Taschenbuch | Einband - flex.(Paperback) | Englisch | 2019 | Elsevier Inc | EAN 9780128124543 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld,… gpsr[at]libri[dot]de | Anbieter: preigu.

- Softcover
Seller: Ria Christie Collections, Uxbridge, United KingdomRia Christie Collections
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£ 194.81
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Condition: New. In.

High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications
Lundin, Daniel (EDT); Minea, Tiberiu (EDT); Gudmundsson, Jon Tomas (EDT)
- Softcover
Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices
Contact seller5-star sellerCondition: Used - As new
£ 213.94
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Condition: As New. Unread book in perfect condition.

High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications
Lundin, Daniel (EDT); Minea, Tiberiu (EDT); Gudmundsson, Jon Tomas (EDT)
- Softcover
Seller: GreatBookPricesUK, Woodford Green, United KingdomGreatBookPricesUK
Contact seller5-star sellerCondition: Used - As new
£ 211.80
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Condition: As New. Unread book in perfect condition.

Language: English
Published by Elsevier Science Publishing Co Inc, US, 2019
- Softcover
Seller: Rarewaves.com USA, London, LONDO, United KingdomRarewaves.com USA
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£ 241.74
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Paperback. Condition: New. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film charact…eristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.

- Softcover
Seller: moluna, Greven, Germanymoluna
Contact seller5-star sellerCondition: New
£ 211.45
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Kartoniert / Broschiert. Condition: New. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its.

Language: English
Published by Elsevier Science Publishing Co Inc, US, 2019
- Softcover
Seller: Rarewaves.com UK, London, United KingdomRarewaves.com UK
Contact seller5-star sellerCondition: New
£ 230.41
£ 65.00 shippingShips from United Kingdom to U.S.A.Quantity: Over 20 available
Paperback. Condition: New. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film charact…eristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.

- Softcover
- Print on Demand
Seller: Brook Bookstore On Demand, Napoli, NA, ItalyBrook Bookstore On Demand
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£ 143.94
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Condition: new. Questo è un articolo print on demand.

- Softcover
- Print on Demand
Seller: Revaluation Books, Exeter, United KingdomRevaluation Books
Contact seller5-star sellerCondition: New
£ 160.25
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Paperback. Condition: Brand New. 384 pages. 9.25x6.25x1.00 inches. In Stock. This item is printed on demand.

Language: English
Published by Elsevier Science & Technology, Elsevier, 2019
- Softcover
- Print on Demand
Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermanyBuchWeltWeit Ludwig Meier e.K.
Contact seller5-star sellerCondition: New
£ 162.18
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Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes… in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Englisch.

- Softcover
- Print on Demand
Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH
Contact seller5-star sellerCondition: New
£ 162.18
£ 53.63 shippingShips from Germany to U.S.A.Quantity: 2 available
Taschenbuch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in t…erms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.