Isbn: 9780521591751 - Plasma Processes for Semiconductor Fabrication: 8 (cambridge Studies in Semiconductor Physics and Microelectronic Engineering, Series Number 8) (20 results)

Hardcover. Condition: Very Good. No Jacket. May have limited writing in cover pages. Pages are unmarked. ~ ThriftBooks: Read More, Spend Less.

hardcover. Condition: Very Good. Dust Jacket Condition: Very Good. previous owners name inked on page edge.

Condition: Good. Your purchase helps support Sri Lankan Children's Charity 'The Rainbow Centre'. Ex-library, so some stamps and wear, but in good overall condition. Our donations to The Rainbow Centre have helped provide an education and a safe haven to hundreds of children who live in appalling conditions.…

Olnbd.m.Oumschl. Condition: Sehr gut. Dust Jacket Condition: Gut. 4 Olnbd.m.Oumschl. en Elektronik, Naturwissenschaften, Physik (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering 8); IX pp., 221 pp. Schutzumschlag: Gut.

Condition: Sehr gut. Zustand: Sehr gut | Sprache: Englisch | Produktart: Bücher | An up-to-date description of plasma etching and deposition in semiconductor fabrication.

Condition: New.

Condition: New.

Condition: As New. Unread book in perfect condition.

Condition: New. In English.

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Condition: As New. Unread book in perfect condition.

Condition: New. An up-to-date description of plasma etching and deposition in semiconductor fabrication. Series: Cambridge Studies in Semiconductor Physics & Microelectronic Engineering. Num Pages: 232 pages, 31 b/w illus. 2 tables 33 exercises. BIC Classification: TJFD5. Category: (P) Professional & Vocational. Dimension: 253 x 177 x 14. Weight in Grams: 650. . 1999. Illustrated. hardcover. . . . .…

Hardcover. Condition: gut. 2014. Plasma Processes for Semiconductor Fabrication In englischer Sprache. pages.

Condition: New. An up-to-date description of plasma etching and deposition in semiconductor fabrication. Series: Cambridge Studies in Semiconductor Physics & Microelectronic Engineering. Num Pages: 232 pages, 31 b/w illus. 2 tables 33 exercises. BIC Classification: TJFD5. Category: (P) Professional & Vocational. Dimension: 253 x 177 x 14. Weight in Grams: 650. . 1999. Illustrated. hardcover. . . . . Books ship from the US and Ireland.…

Hardcover. Condition: Brand New. 221 pages. 10.50x7.50x0.75 inches. In Stock.

Buch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.…

Hardcover. Condition: new. Hardcover. Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry. Provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. Can be used as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry. This item is printed on demand. Shipping may be from our UK warehouse or from our Australian or US warehouses, depending on stock availability.…

Gebunden. Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level t.…

Buch. Condition: Neu. Plasma Processes for Semiconductor Fabrication | W. Nicholas G. Hitchon | Buch | Englisch | 2014 | Cambridge University Press | EAN 9780521591751 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld, gpsr[at]libri[dot]de | Anbieter: preigu Print on Demand.…

Hardback. Condition: New. This item is printed on demand. New copy - Usually dispatched within 5-9 working days.