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Reliability by Carter (27 results)
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Mechanical Reliability
Language: English
Published by John Wiley & Sons Inc--Halsted Press, 1972
ISBN 10: 0470138521 ISBN 13: 9780470138526
First Edition
Hardcover. Condition: Very Good. Dust Jacket Condition: Very Good. 1st American Edition. Dark covers with white lettering on spine. Former owner's name on front cover and thin brown line going down front endpaper probably caused by dust jacket's edge. Silver dust jacket with black lettering.
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Condition: Fair. This is an ex-library book and may have the usual library/used-book markings inside.This book has hardback covers. Clean from markings. In fair condition, suitable as a study copy. No dust jacket. Please note the Image in this listing is a stock photo and may not match the covers of the actual item,450grams, ISBN:0333138317.
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Hardcover. Condition: Very Good. Dust Jacket Condition: Very Good. hardback book and dust jacket in very good condition.
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Soft cover. Condition: Very Good. 2nd Edition. No inscriptions and very little use. A clean, tight copy of xvi. 492pp.
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Mechanical Reliability Second Edition
Language: English
Published by John Wiley & Sons, New York, 1986
ISBN 10: 0470206942 ISBN 13: 9780470206942
Hardcover. Condition: Very Good. Dust Jacket Condition: Very Good. Second Edition. Expedited or International shipping may cost more.
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Hardcover. Condition: Good. No Jacket. Former library book; Pages can have notes/highlighting. Spine may show signs of wear. ~ ThriftBooks: Read More, Spend Less.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics ? 2004 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Condition: New.
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Condition: Fair. This is an ex-library book and may have the usual library/used-book markings inside.This book has hardback covers. In fair condition, suitable as a study copy. No dust jacket. Please note the Image in this listing is a stock photo and may not match the covers of the actual item,550grams, ISBN:9780333694657.
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Condition: Fair. This is an ex-library book and may have the usual library/used-book markings inside.This book has soft covers. In fair condition, suitable as a study copy. Please note the Image in this listing is a stock photo and may not match the covers of the actual item,800grams, ISBN:9780333405871.
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Condition: Poor. This is an ex-library book and may have the usual library/used-book markings inside.This book has hardback covers. In poor condition, suitable as a reading copy. Please note the Image in this listing is a stock photo and may not match the covers of the actual item,550grams, ISBN:9780333694657.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics ? 2004 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
£ 30.70
£ 11.98 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketCondition: New. In.
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Condition: Very Good. Most items will be dispatched the same or the next working day. A copy that has been read, but is in excellent condition. Pages are intact and not marred by notes or highlighting. The spine remains undamaged.
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Condition: Good. Most items will be dispatched the same or the next working day. A copy that has been read but remains in clean condition. All of the pages are intact and the cover is intact and the spine may show signs of wear. The book may have minor markings which are not specifically mentioned.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics 2004
Language: English
Published by Cambridge University Press 2014-05, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
PF. Condition: New.
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Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics - 2004 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Seller: Kennys Bookshop and Art Galleries Ltd., Galway, GY, Ireland
Seller rating 5 out of 5 stars
Condition: New.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics, 2004
Language: English
Published by Cambridge University Press CUP, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Condition: New. pp. 422.
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Materials, Technology and Reliability for Advanced Interconnects and Low-k Dielectrics - 2004 (MRS Proceedings)
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Condition: New.
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Condition: Buone. inglese Condizioni dell'esterno: Discrete con difetti, strappi Condizioni dell'interno: Buone.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics 2004
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - The scaling of device dimensions with a simultaneous increase in functional density has imposed tremendous challenges for materials, technology, integration and reliability of interconnects. To meet requirements of the ITRS roadmap, new materials are being introduced at a faster pace in all functions of multilevel interconnects. The issues addressed in this book cannot be dispelled as simply selecting a low-k material and integrating it into a copper damascene process. The intricacies of the back end for sub-100nm technology include novel processing of low-k materials, employing pore-sealing techniques and capping layers, introducing advanced dielectric and diffusion barriers, and developing novel integration schemes. This is in addition to concerns of performance, yield, and reliability appropriate to nanoscaled interconnects. Although many challenges continue to impede progress along the ITRS roadmap, the contributions in this book confront them head-on. It provides a scientific understanding of the issues and stimulate new approaches to advanced multilevel interconnects.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics 2004 (Paperback)
Language: English
Published by Cambridge University Press, Cambridge, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Paperback. Condition: new. Paperback. The scaling of device dimensions with a simultaneous increase in functional density has imposed tremendous challenges for materials, technology, integration and reliability of interconnects. To meet requirements of the ITRS roadmap, new materials are being introduced at a faster pace in all functions of multilevel interconnects. The issues addressed in this book cannot be dispelled as simply selecting a low-k material and integrating it into a copper damascene process. The intricacies of the back end for sub-100nm technology include novel processing of low-k materials, employing pore-sealing techniques and capping layers, introducing advanced dielectric and diffusion barriers, and developing novel integration schemes. This is in addition to concerns of performance, yield, and reliability appropriate to nanoscaled interconnects. Although many challenges continue to impede progress along the ITRS roadmap, the contributions in this book confront them head-on. It provides a scientific understanding of the issues and stimulate new approaches to advanced multilevel interconnects. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This item is printed on demand. Shipping may be from multiple locations in the US or from the UK, depending on stock availability.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics â" 2004
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Paperback. Condition: Brand New. 1st edition. 422 pages. 8.90x6.00x1.00 inches. In Stock. This item is printed on demand.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics - 2004
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Seller: THE SAINT BOOKSTORE, Southport, United Kingdom
Seller rating 5 out of 5 stars
£ 34.53
£ 16.35 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketPaperback / softback. Condition: New. This item is printed on demand. New copy - Usually dispatched within 5-9 working days.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics, 2004
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Condition: New. Print on Demand pp. 422.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics, 2004
Language: English
Published by Cambridge University Press, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Condition: New. PRINT ON DEMAND pp. 422.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics 2004 (Paperback)
Language: English
Published by Cambridge University Press, Cambridge, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Paperback. Condition: new. Paperback. The scaling of device dimensions with a simultaneous increase in functional density has imposed tremendous challenges for materials, technology, integration and reliability of interconnects. To meet requirements of the ITRS roadmap, new materials are being introduced at a faster pace in all functions of multilevel interconnects. The issues addressed in this book cannot be dispelled as simply selecting a low-k material and integrating it into a copper damascene process. The intricacies of the back end for sub-100nm technology include novel processing of low-k materials, employing pore-sealing techniques and capping layers, introducing advanced dielectric and diffusion barriers, and developing novel integration schemes. This is in addition to concerns of performance, yield, and reliability appropriate to nanoscaled interconnects. Although many challenges continue to impede progress along the ITRS roadmap, the contributions in this book confront them head-on. It provides a scientific understanding of the issues and stimulate new approaches to advanced multilevel interconnects. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This item is printed on demand. Shipping may be from our UK warehouse or from our Australian or US warehouses, depending on stock availability.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics 2004
Language: English
Published by Cambridge University Press, 2012
ISBN 10: 1107409225 ISBN 13: 9781107409224
Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.KlappentextThe MRS Symposium Proceeding series is an internationally recognised reference suitable for research.
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Materials, Technology and Reliability for Advanced Interconnects and Low-K Dielectrics 2004 (Paperback)
Language: English
Published by Cambridge University Press, Cambridge, 2014
ISBN 10: 1107409225 ISBN 13: 9781107409224
Paperback. Condition: new. Paperback. The scaling of device dimensions with a simultaneous increase in functional density has imposed tremendous challenges for materials, technology, integration and reliability of interconnects. To meet requirements of the ITRS roadmap, new materials are being introduced at a faster pace in all functions of multilevel interconnects. The issues addressed in this book cannot be dispelled as simply selecting a low-k material and integrating it into a copper damascene process. The intricacies of the back end for sub-100nm technology include novel processing of low-k materials, employing pore-sealing techniques and capping layers, introducing advanced dielectric and diffusion barriers, and developing novel integration schemes. This is in addition to concerns of performance, yield, and reliability appropriate to nanoscaled interconnects. Although many challenges continue to impede progress along the ITRS roadmap, the contributions in this book confront them head-on. It provides a scientific understanding of the issues and stimulate new approaches to advanced multilevel interconnects. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This item is printed on demand. Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability.
