Isbn: 9781851661886 - Rumen Microbial Ecosystem (12 results)

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  • Language: English

    Published by Elsevier Applied Science London,, 1988

    1851661883 / 9781851661886

    • Hardcover

    Seller: Bernhard Kiewel Rare Books, Grünberg, GermanyBernhard Kiewel Rare Books

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    25 x 17. 527 Seiten. Hardcover. Ordnungsgemäß aus einer Universitäts-Bibliothek ausgesondert (Stempel, Signatur). Sehr guter Zustand. Gewicht über 1 kg. Sprache: Englisch Gewicht in Gramm: 1077.

  • Language: English

    Published by Springer, 1988

    1851661883 / 9781851661886

    • Hardcover

    Seller: Ria Christie Collections, Uxbridge, United KingdomRia Christie Collections

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    Condition: New. In English.

  • Language: English

    Published by Springer, 1988

    1851661883 / 9781851661886

    • Hardcover

    Seller: GreatBookPricesUK, Woodford Green, United KingdomGreatBookPricesUK

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  • Language: English

    Published by Springer, 1988

    1851661883 / 9781851661886

    • Hardcover

    Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices

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  • Language: English

    Published by Springer, 1988

    1851661883 / 9781851661886

    • Hardcover

    Seller: GreatBookPrices, Columbia, MD, U.S.A.GreatBookPrices

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    Condition: As New. Unread book in perfect condition.

  • Language: English

    Published by Springer, 1988

    1851661883 / 9781851661886

    • Hardcover

    Seller: GreatBookPricesUK, Woodford Green, United KingdomGreatBookPricesUK

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    Condition: As New. Unread book in perfect condition.

  • Language: English

    Published by Springer, 1988

    1851661883 / 9781851661886

    • Hardcover

    Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH

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    Buch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

  • Language: English

    Published by Elsevier Applied Science London, 1988

    1851661883 / 9781851661886

    • Hardcover

    Seller: BUCHSERVICE / ANTIQUARIAT Lars Lutzer, Wahlstedt, GermanyBUCHSERVICE / ANTIQUARIAT Lars Lutzer

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    Condition: Used - Very good

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    Condition: gut. 1988. Rumen Microbial Ecosystem In englischer Sprache. pages.

  • Language: English

    Published by Springer Netherlands, 1988

    1851661883 / 9781851661886

    • Hardcover
    • Print on Demand

    Seller: moluna, Greven, Germanymoluna

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    Gebunden. Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. KlappentextPrinciples of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical f.

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    Language: English

    Published by Springer Netherland, 1988

    1851661883 / 9781851661886

    • Hardcover
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    Seller: preigu, Osnabrück, Germanypreigu

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    Buch. Condition: Neu. Rumen Microbial Ecosystem | C. S. Stewart (u. a.) | Buch | xii | Englisch | 1988 | Springer Netherland | EAN 9781851661886 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu Print on Demand.

  • Language: English

    Published by Springer Netherlands Dez 1988, 1988

    1851661883 / 9781851661886

    • Hardcover
    • Print on Demand

    Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermanyBuchWeltWeit Ludwig Meier e.K.

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    Buch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding. 540 pp. Englisch.

  • Language: English

    Published by Springer Netherlands, Springer Netherlands Dez 1988, 1988

    1851661883 / 9781851661886

    • Hardcover
    • Print on Demand

    Seller: buchversandmimpf2000, Emtmannsberg, BAYE, Germanybuchversandmimpf2000

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    Buch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 540 pp. Englisch.