Diederik Depla (18 results)

Condition: Bueno. : Este libro trata sobre la deposición por pulverización reactiva, abordando los fundamentos y aplicaciones de esta técnica en la ciencia de los materiales. Explora los procesos físicos y químicos involucrados en la creación de películas delgadas mediante la pulverización reactiva, ofreciendo una visión detallada para estudiantes y profesionales del campo. EAN: 9783642095368 Tipo: Libros Categoría: Ciencias|Tecnología Título: Reactive Sputter Deposition Autor: Diederik Depla| Stijn Mahieu Páginas: 590 Formato: tapa blanda.

Taschenbuch. Condition: Neu. Sputtering onions | Diederik Depla | Taschenbuch | Englisch | Brave New Books | EAN 9789465315782 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.

Condition: New. In.

Taschenbuch. Condition: Neu. Reactive Sputter Deposition | Diederik Depla (u. a.) | Taschenbuch | Springer Series in Materials Science | xviii | Englisch | 2010 | Springer | EAN 9783642095368 | Verantwortliche Person für die EU: Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg, juergen[dot]hartmann[at]springer[dot]com | Anbieter: preigu.

Buch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.

Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.

Hardcover. Condition: Brand New. 1st edition. 572 pages. 9.25x6.25x1.50 inches. In Stock.

Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Magnetron sputtering is a mature technique for the deposition of thin films, both at laboratory and industrial level. Conceptually, the technique is quite simple and the process can be summarized in a few lines. A gas discharge is ignited by the application of a high voltage between a cathode and an anode. To increase the ionization efficiency of the electrons emitted from the cathode, a magnetic field is generated by a set of magnets placed behind the cathode. The ions present in the plasma, bombard the cathode which results in the ejection or sputtering of atoms. These sputtered atoms condense on the vacuum chamber walls and on the substrate to form a thin film. Behind this apparent simplicity, a complex interplay between different physical and chemical processes is hidden. This is especially the case when a reactive gas is added to the discharge. This book does not discuss all these processes in detail but provides, through a series of images, an overview of them. The short description accompanying the image can serve as a starting point for a more in-depth study. 110 pp. Englisch.

Taschenbuch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Magnetron sputtering is a mature technique for the deposition of thin films, both at laboratory and industrial level. Conceptually, the technique is quite simple and the process can be summarized in a few lines. A gas discharge is ignited by the application of a high voltage between a cathode and an anode. To increase the ionization efficiency of the electrons emitted from the cathode, a magnetic field is generated by a set of magnets placed behind the cathode. The ions present in the plasma, bombard the cathode which results in the ejection or sputtering of atoms. These sputtered atoms condense on the vacuum chamber walls and on the substrate to form a thin film. Behind this apparent simplicity, a complex interplay between different physical and chemical processes is hidden. This is especially the case when a reactive gas is added to the discharge. This book does not discuss all these processes in detail but provides, through a series of images, an overview of them. The short description accompanying the image can serve as a starting point for a more in-depth study.

Condition: new. Questo è un articolo print on demand.

Condition: new. Questo è un articolo print on demand.

Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Covers all the sputtering techniques for thin-film depositionDescribes the physical basics and related technical realizationGives advice on controlling the sputter process and quality of the layers producedValuable reference work for.

Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Covers all the sputtering techniques for thin-film depositionDescribes the physical basics and related technical realizationGives advice on controlling the sputter process and quality of the layers producedValuable reference work for.

Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge. 592 pp. Englisch.

Buch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge. 592 pp. Englisch.

Taschenbuch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.Springer Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 592 pp. Englisch.

Buch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti c and technical papers is published each year on this topic. Sputter deposition is one of the many so-called physical vapour deposition (PVD) techniques. In most cases, sputter deposition uses a magnetically enhanced glow discharge or magnetron discharge to produce the ions which bombard and sputter the cathode material. In the rst chapter of this book (Chap. 1), the details of the sputter process are discussed. Essential to sustain the discharge is the electron emission during ion bombardment. Indeed, the emitted electrons are accelerated from the target and can ionize gas atoms. The formed ions bombard again the target completing the s- taining process. A complete chapter is assigned to this process to highlight its importance (Chap. 2). Although the sustaining process can be described quite straightforward, a complete understanding of the magnetron discharge and the in uence of di erent parameters on the discharge characteristics is onlypossiblebymodelling(seeChap.3).Withthesethreechapters,thereader should be able to form an idea of the target and plasma processes occurring during a DC magnetron discharge.Springer-Verlag GmbH, Tiergartenstr. 17, 69121 Heidelberg 592 pp. Englisch.

Condition: New. Print on Demand pp. 592.