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Daniel Tiberiu (18 results)
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Bran Museum Art and History
Published by Profile Publishing
Seller: Wonder Book, Frederick, MD, U.S.A.
Seller rating 5 out of 5 stars
Condition: Very Good. Very Good condition. (Romania, castles, guidebooks).
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Condition: Bueno. : Este libro explora la figura de Drácula, analizando si es un mito o una realidad. A través de sus páginas, el autor Daniel Tiberiu Apostol examina la leyenda de Drácula, posiblemente contrastándola con hechos históricos o culturales. El libro, publicado en 2005, ofrece una perspectiva en inglés sobre este personaje icónico. EAN: 9789738642348 Tipo: Libros Categoría: Historia Título: Dracula. Myth or Reality Autor: Daniel Tiberiu Apostol Editorial: ohne Verlagsangabe Idioma: en Páginas: 48 Formato: tapa blanda.
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Condition: New. pp. 398.
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Condition: New. pp. 398.
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Condition: New. pp. 398.
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High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
£ 181.85
£ 15 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketCondition: New.
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High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
£ 189.94
£ 11.98 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketCondition: New. In.
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Taschenbuch. Condition: Neu. High Power Impulse Magnetron Sputtering | Fundamentals, Technologies, Challenges and Applications | Daniel Lundin (u. a.) | Taschenbuch | Einband - flex.(Paperback) | Englisch | 2019 | Elsevier | EAN 9780128124543 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.
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Condition: As New. Unread book in perfect condition.
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High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
£ 216.43
£ 15 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketCondition: As New. Unread book in perfect condition.
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High Power Impulse Magnetron Sputtering
Language: English
Published by Elsevier Science Publishing Co Inc, US, 2019
ISBN 10: 0128124547 ISBN 13: 9780128124543
Seller: Rarewaves.com USA, London, LONDO, United Kingdom
Seller rating 5 out of 5 stars
£ 269.27
Free Shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketPaperback. Condition: New. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
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High Power Impulse Magnetron Sputtering
Language: English
Published by Elsevier Science Publishing Co Inc, US, 2019
ISBN 10: 0128124547 ISBN 13: 9780128124543
£ 246.95
£ 65 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketPaperback. Condition: New. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
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Condition: new. Questo è un articolo print on demand.
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Paperback. Condition: Brand New. 384 pages. 9.25x6.25x1.00 inches. In Stock. This item is printed on demand.
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High Power Impulse Magnetron Sputtering
Language: English
Published by Elsevier Science & Technology, Elsevier, 2019
ISBN 10: 0128124547 ISBN 13: 9780128124543
Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany
Seller rating 5 out of 5 stars
Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Englisch.
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High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications
Language: English
Published by Elsevier Science & Technology|Elsevier, 2019
ISBN 10: 0128124547 ISBN 13: 9780128124543
Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of bo.
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High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications
Language: English
Published by Elsevier Science & Technology, Elsevier, 2019
ISBN 10: 0128124547 ISBN 13: 9780128124543
Taschenbuch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
