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Minea Tiberiu (29 results)
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Theoretical Treatment of Electron Emission and Related Phenomena
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
£ 127.60
£ 11.98 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
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Theoretical Treatment of Electron Emission and Related Phenomena
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
£ 127.60
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Add to basketCondition: New. In.
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Condition: New. pp. 398.
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Condition: Hervorragend. Zustand: Hervorragend | Sprache: Englisch | Produktart: Bücher | This book introduces readers to the physics governing electron emission under high voltages and temperatures, and highlights recent modeling and numerical developments for describing these phenomena. It begins with a brief introduction, presenting several applications that have driven electron emission research in the last few decades. The authors summarize the most relevant theories including the physics of thermo-field electron emission and the main characteristic parameters. Based on these theories, they subsequently describe numerical multi-physics models and discuss the main findings on the effect of space charges, emitter geometry, pulse duration, etc.Beyond the well-known photoelectric effect, the book reviews recent advanced theories on photon-metal interaction. Distinct phenomena occur when picosecond and femtosecond lasers are used to irradiate a surface. Their consequences on metal electron dynamics and heating are presented and discussed, leading to various emission regimes ż in and out of equilibrium. In closing, the book reviews the effects of electron emission on high-voltage operation in vacuum, especially breakdown and conditioning, as the most common examples. The book offers a uniquely valuable resource for graduate and PhD students whose work involves electron emission, high-voltage holding, laser irradiation of surfaces, vacuum or discharge breakdown, but also for academic researchers and professionals in the field of accelerators and solid state physics with an interest in this highly topical area.
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Condition: New.
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Condition: New. pp. 398.
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Condition: New. 1st ed. 2022 edition NO-PA16APR2015-KAP.
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Condition: New. pp. 398.
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High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
£ 186.03
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Taschenbuch. Condition: Neu. High Power Impulse Magnetron Sputtering | Fundamentals, Technologies, Challenges and Applications | Daniel Lundin (u. a.) | Taschenbuch | Einband - flex.(Paperback) | Englisch | 2019 | Elsevier Inc | EAN 9780128124543 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld, gpsr[at]libri[dot]de | Anbieter: preigu.
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Paperback. Condition: Brand New. 230 pages. 9.25x6.10x0.49 inches. In Stock.
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High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
£ 194.81
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Hardcover. Condition: Brand New. 230 pages. 9.25x6.10x0.56 inches. In Stock.
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Condition: As New. Unread book in perfect condition.
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High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
£ 216.66
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High Power Impulse Magnetron Sputtering
Language: English
Published by Elsevier Science Publishing Co Inc, US, 2019
ISBN 10: 0128124547 ISBN 13: 9780128124543
Seller: Rarewaves.com USA, London, LONDO, United Kingdom
Seller rating 5 out of 5 stars
£ 241.50
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Add to basketPaperback. Condition: New. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
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Condition: New. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its.
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Theoretical Treatment of Electron Emission and Related Phenomena Tiberiu Minea
Seller: BUCHSERVICE / ANTIQUARIAT Lars Lutzer, Wahlstedt, Germany
Seller rating 5 out of 5 stars
Hardcover. Condition: gut. 2022. Theoretical Treatment of Electron Emission and Related Phenomena In deutscher Sprache. pages.
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High Power Impulse Magnetron Sputtering
Language: English
Published by Elsevier Science Publishing Co Inc, US, 2019
ISBN 10: 0128124547 ISBN 13: 9780128124543
£ 222.14
£ 65 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketPaperback. Condition: New. High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
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Hardcover. Condition: Brand New. 230 pages. 9.25x6.10x0.56 inches. In Stock. This item is printed on demand.
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Condition: new. Questo è un articolo print on demand.
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Paperback. Condition: Brand New. 384 pages. 9.25x6.25x1.00 inches. In Stock. This item is printed on demand.
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High Power Impulse Magnetron Sputtering
Language: English
Published by Elsevier Science & Technology, Elsevier, 2019
ISBN 10: 0128124547 ISBN 13: 9780128124543
Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany
Seller rating 5 out of 5 stars
Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Englisch.
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Condition: New. Print on Demand.
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Condition: New. Print on Demand.
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Condition: New. PRINT ON DEMAND.
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Condition: New. PRINT ON DEMAND.
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High Power Impulse Magnetron Sputtering : Fundamentals, Technologies, Challenges and Applications
Language: English
Published by Elsevier Science & Technology, Elsevier, 2019
ISBN 10: 0128124547 ISBN 13: 9780128124543
Taschenbuch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.
