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Simulation Deposition Processes Pecvd by Geiser Juergen (15 results)
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Simulation of Deposition Processes with PECVD Apparatus: Theory and Applications
Published by Nova Science Pub Inc, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
Condition: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
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Simulation of Deposition Processes with PECVD Apparatus: Theory and Applications
Published by Nova Science Pub Inc, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
Condition: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
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Simulation of Deposition Processes with PECVD Apparatus: Theory and Applications
Published by Nova Science Pub Inc, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
Condition: New. Brand New Original US Edition. Customer service! Satisfaction Guaranteed.
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Simulation of Deposition Processes with PECVD Apparatus
Published by Nova Science Publishers, Incorporated, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
Condition: New. pp. 162 Index.
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Simulation of Deposition Processes with PECVD Apparatus
Published by Nova Science Publishers, Incorporated, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
£ 61.25
Convert currency£ 6.50 shipping from United Kingdom to U.S.A.Quantity: 1 available
Add to basketCondition: New. pp. 162.
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Simulation of Deposition Processes with PECVD Apparatus
Published by Nova Science Publishers Inc, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
HRD. Condition: New. New Book. Shipped from UK. Established seller since 2000.
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Simulation of Deposition Processes with PECVD Apparatus
Published by Nova Science Publishers, Incorporated, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
Condition: New. pp. 162.
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Simulation of Deposition Processes with PECVD Apparatus
Published by Nova Science Publishers Inc, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
Seller: PBShop.store UK, Fairford, GLOS, United Kingdom
Seller rating 5 out of 5 stars
£ 72.48
Convert currency£ 4.16 shipping from United Kingdom to U.S.A.Quantity: 1 available
Add to basketHRD. Condition: New. New Book. Shipped from UK. Established seller since 2000.
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Simulation of Deposition Processes with PECVD Apparatus
Published by Nova Science Publishers Inc, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
Seller: Kennys Bookshop and Art Galleries Ltd., Galway, GY, Ireland
Seller rating 5 out of 5 stars
Condition: New. Num Pages: 144 pages, Illustrations. BIC Classification: TGM. Category: (P) Professional & Vocational. Dimension: 234 x 162 x 14. Weight in Grams: 352. . 2012. Hardcover. . . . .
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Simulation of Deposition Processes with PECVD Apparatus
Published by Nova Science Publishers Inc, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
Seller: THE SAINT BOOKSTORE, Southport, United Kingdom
Seller rating 5 out of 5 stars
£ 81.37
Convert currency£ 14.46 shipping from United Kingdom to U.S.A.Quantity: 2 available
Add to basketHardback. Condition: New. New copy - Usually dispatched within 4 working days. 371.
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Simulation of Deposition Processes with PECVD Apparatus
Published by Nova Science Publishers Inc, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
Condition: New. Num Pages: 144 pages, Illustrations. BIC Classification: TGM. Category: (P) Professional & Vocational. Dimension: 234 x 162 x 14. Weight in Grams: 352. . 2012. Hardcover. . . . . Books ship from the US and Ireland.
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Geiser, J: Simulation of Deposition Processes with PECVD App
Published by Nova Science Publishers Inc, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
£ 74.25
Convert currency£ 42.57 shipping from Germany to U.S.A.Quantity: 1 available
Add to basketGebunden. Condition: New. Discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. This title presents underlying hierarchy of models for low-temperature and low-pressure plasma in order to discuss the processes that can be used to i.
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Simulation of Deposition Processes with PECVD Apparatus
Published by Nova Science Publishers Inc Jan 2012, 2012
ISBN 10: 1621003655 ISBN 13: 9781621003656
Language: English
£ 92.37
Convert currency£ 53.66 shipping from Germany to U.S.A.Quantity: 2 available
Add to basketBuch. Condition: Neu. Neuware - This book discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models.
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Simulation of Deposition Processes with PECVD Apparatus: Theory and Applications
ISBN 10: 1622571223 ISBN 13: 9781622571222
Condition: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
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Simulation of Deposition Processes with PECVD Apparatus: Theory and Applications
ISBN 10: 1622571223 ISBN 13: 9781622571222
Condition: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
