Title: Simulation of Deposition Processes with PECVD Apparatus: Theory and Applications
Publisher: Nova Science Pub Inc
Publication Date: 2012
Language: English
ISBN 10: 1621003655
ISBN 13: 9781621003656
Binding: Hardcover
Condition: New

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Synopsis

This book discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models.

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