Order Total (1 Item Items):
Shipping Destination:
Helbert John (19 results)
Skip to main search results
Search filters
Product Type
- All Product Types
- Books (19)
- Magazines & Periodicals (No further results match this refinement)
- Comics (No further results match this refinement)
- Sheet Music (No further results match this refinement)
- Art, Prints & Posters (No further results match this refinement)
- Photographs (No further results match this refinement)
- Maps (No further results match this refinement)
- Manuscripts & Paper Collectibles (No further results match this refinement)
Condition Learn more
- New (14)
- As New, Fine or Near Fine (3)
- Very Good or Good (2)
- Fair or Poor (No further results match this refinement)
- As Described (No further results match this refinement)
Binding
- All Bindings
- Hardcover (19)
- Softcover (No further results match this refinement)
Collectible Attributes
- First Edition (1)
- Signed (No further results match this refinement)
- Dust Jacket (1)
- Seller-Supplied Images (8)
- Not Print on Demand (15)
Language (1)
Free Shipping
Seller Location
Seller Rating
-
Condition: Brand New. New. US edition. Expediting shipping for all USA and Europe orders excluding PO Box. Excellent Customer Service.
-
Condition: New. This is a Brand-new US Edition. This Item may be shipped from US or any other country as we have multiple locations worldwide.
-
Handbook of VLSI Microlithography
Language: English
Published by William Andrew Publishing, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Condition: New. pp. 672 Illus.
-
Handbook of VLSI Microlithography
Language: English
Published by William Andrew Publishing, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Condition: New. pp. 672.
-
Handbook of VLSI Microlithography: Principles, Technology and Applications (Materials Science and Process Technology)
Language: English
Published by William Andrew 1991-01-01, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
£ 38.50
£ 15.49 shipping
Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketHardcover. Condition: New.
-
-
Handbook of VLSI Microlithography
Language: English
Published by William Andrew Publishing, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Condition: New. pp. 672.
-
Condition: As New. Unread book in perfect condition.
-
Handbook of VLSI Microlithography: Principles, Technology and Applications (Materials Science and Process Technology)
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
Condition: New. In.
-
Handbook of Vlsi Microlithography : Principles, Technology and Applications
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
Condition: New.
-
Vintage Handbook of VLSI MICROLITHOGRAPHY (Review Copy prepublication) by William B. Glendinning, John N. Helbert (First Edition) (1991)
Language: English
Published by Noyes Data Corporation, NJ, 1991
First Edition
Hardcover. Condition: Very Good. Dust Jacket Condition: Very Good. First Edition. Edited by William B. Glendinning and John N. Helbert, this 1991 technical volume is a detailed reference work on the science and engineering of microlithography?the core process used to manufacture integrated circuits in microelectronics. The book explains how patterns are transferred onto semiconductor wafers using light, electron beams, and X-ray techniques. It covers both theoretical foundations and practical applications, including photoresist chemistry, optical systems, resolution limits, and process control. Topics such as positive vs. negative resists, thin-film behavior, and defect management are addressed in depth. As part of a broader materials science and process technology series, it compiles contributions from multiple experts, making it a comprehensive snapshot of lithographic technology at the dawn of the modern VLSI (Very Large Scale Integration) era. It is aimed primarily at engineers, researchers, and advanced students working in semiconductor fabrication. THIS "Review Copy" was delivered before the actual publication date of 1/15/1992. Hard cover edition with unclipped dustjacket. 649 pages. Dimensions: 6.25" by 9.5". Published by Noyes Data Corporation, NJ. 1st printing, 1991. B&W illustrations. B&W photographs. Black binding. Dustjacket defect(s): Some tears. Some wrinkling/creasing. 3.25 Pound Media Shipping Rate with Multiple Product Orders. (Min Shipping Rate 1 Pound per Order). Order More and SAVE! Genre(s): Electronics / Technology / Semiconductors / English. (B106).
-
Handbook of Vlsi Microlithography : Principles, Technology and Applications
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
Condition: As New. Unread book in perfect condition.
-
HANDBK OF VLSI MICROLITHOGRAPH
Language: English
Published by Elsevier Science & Technology|William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Gebunden. Condition: New. Offers a look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and x-ray lithography.This han.
-
Condition: Gut. Zustand: Gut | Seiten: 1022 | Sprache: Englisch | Produktart: Bücher | Keine Beschreibung verfügbar.
-
Hardcover. Condition: Like New. Like New. book.
-
Condition: new. Questo è un articolo print on demand.
-
Hardcover. Condition: Brand New. 1st edition. 671 pages. 10.00x6.75x2.25 inches. In Stock. This item is printed on demand.
-
Buch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
-
Handbook of VLSI Microlithography
Language: English
Published by Elsevier Inc Jan 1991, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany
Seller rating 5 out of 5 stars
Buch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook. 672 pp. Englisch.
