Semiconductor Device Analysis Using Photon Emission Microscopy
Language: English
Published by John Wiley & Sons, 2000
- Hardcover
- New
Seller: moluna, Greven, Germanymoluna
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Condition: New
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Add to basketItem description from seller
This reference details the principles of design, calibration, and use of photon emission microscopy (PEM) as a fault localization technique used for analyzing device reliability and failure. (SciTech Book News Vol. 25, No. 2 June 2001)The diminishing .
Seller Inventory # 446916852
- Title
- Semiconductor Device Analysis Using Photon Emission Microscopy
- Author
- WK Chim
- Publisher
- John Wiley & Sons
- Publication year
- 2000
- Condition
- New
- Binding
- Gebunden
- Language
- English
- ISBN 10
- 047149240X
- ISBN 13
- 9780471492405
* Illustrates the application of the PEM technique in various areas of device reliability, in particular hot-carrier, oxide and ESD reliability.
* Presents the principles of design and calibration for a spectroscopic emission microscope system along with coverage of the three main operation modes: frontside, backside and spectroscopic PEM
* Provides an analysis of light emission in semiconductors under hot-carrier and high-field impulse stressing in MOS transistors and photon emission from biased MOS capacitors.
Not only an essential reference for researchers and students in the field, the numerous practical examples throughout the text also make this an indispensible guide for failure analysis engineers and microelectrics industry professionals.
"Synopsis" may belong to another edition of this title.
About the Author
Wai Kin Chim is the author of Semiconductor Device and Failure Analysis : Using Photon Emission Microscopy , published by Wiley.
"About the title" may belong to another edition of this title.
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