The Physics of Submicron Lithography

Language: English

Published by Springer US Mrz 1992, 1992

0306435780 / 9780306435782

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Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermanyBuchWeltWeit Ludwig Meier e.K.

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Hardcover

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This item is printed on demand - it takes 3-4 days longer - Neuware -This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit. 516 pp. Englisch.…

Seller Inventory # 9780306435782

Title
The Physics of Submicron Lithography
Author
Kamil A. Valiev
Publisher
Springer US Mrz 1992
Publication year
1992
Condition
Neu
Binding
Buch
Language
English
ISBN 10
0306435780
ISBN 13
9780306435782
Item weight
1,157 grams
Dimensions
260x183x33 mm

BuchWeltWeit Ludwig Meier e.K.

Bergisch Gladbach, Germany

5-star seller

AbeBooks seller since January 11, 2012

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BuchWeltWeit Ludwig Meier e.K.

Germany