Investigations on Magnetron Sputtered Titanium based Oxide Films

Language: English

Published by LAP LAMBERT Academic Publishing Mai 2016, 2016

3659874817 / 9783659874819

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Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermanyBuchWeltWeit Ludwig Meier e.K.

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This item is printed on demand - it takes 3-4 days longer - Neuware -The size reduction of Complementary Metal Oxide Semiconductor (CMOS) transistors requires replacement of conventional SiO2 layer with higher dielectric constant (k) material for gate dielectric, in order to reduce the gate leakage current and also to maximize gate capacitance. Among the many possible transition- metal oxide materials, titanium dioxide (TiO2) is a potential candidate because of its high energy band gap, refractive index and dielectric constant. 180 pp. Englisch.

Seller Inventory # 9783659874819

Title
Investigations on Magnetron Sputtered Titanium based Oxide Films
Author
Chandra Sekhar Musalikunta
Publisher
LAP LAMBERT Academic Publishing Mai 2016
Publication year
2016
Condition
Neu
Binding
Taschenbuch
Language
English
ISBN 10
3659874817
ISBN 13
9783659874819
Item weight
286 grams
Dimensions
220x150x11 mm

BuchWeltWeit Ludwig Meier e.K.

Bergisch Gladbach, Germany

5-star seller

AbeBooks seller since January 11, 2012

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BuchWeltWeit Ludwig Meier e.K.

Germany