Items related to Investigation on SiGe Selective Epitaxy for Source...

Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond - Softcover

Book 652 of 797: Springer Theses

Wang, Guilei

 
9789811500473: Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
Softcover
ISBN 10: 9811500479 ISBN 13: 9789811500473
Publisher: Springer, 2019

This specific ISBN edition is currently not available.

Synopsis

Introduction.- Strain technology of Si-based materials.- SiGe Epitaxial Growth and material characterization.- SiGe Source and Drain Integration and transistor performance investigation.- Pattern Dependency behavior of SiGe Selective Epitaxy.- Summary and final words.

"synopsis" may belong to another edition of this title.

Publisher
Springer
Publication date
2019
Language
English
ISBN 10 
9811500479
ISBN 13 
9789811500473
Binding
Paperback