The proceedings of the Fourth International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98) cover all aspects of ultra-clean Si-technology: cleaning, contamination control, Si-surface chemistry and topography, and its relationship to device performance and process yield. New areas of concern include: cleaning at the interconnect level, resist strip and polymer removal (dry and wet), cleaning and contamination aspects of metallization, wafer backside cleaning and cleaning after Chemical-Mechanical-Polishing (CMP).
"synopsis" may belong to another edition of this title.
Seller: Alplaus Books, Alplaus, NY, U.S.A.
Paperback. Condition: Good. Solid State Phenomena, Vols. 65-66. Name on first page, else no markings noted. Gentle usage wear. Seller Inventory # 37215aaoz