X-Ray Diffraction at Elevated Temperatures: A Method for in Situ Process Analysis - Hardcover

Chung, Deborah D. L.; Et Al

 
9783527278428: X-Ray Diffraction at Elevated Temperatures: A Method for in Situ Process Analysis

Synopsis

This monograph provides detailed information on the principles, instrumentation, and application of X-ray diffraction at elevated temperatures. More particularly, it summarizes the uses of intense X-ray sources and position-sensitive detectors to assess them in comparison with competing techniques for in situ process analysis at elevated temperatures. This book is intended for use in the training of personnel and in the promotion of the process. Within the areas of X-ray diffraction, materials characterization and thermal analysis, it should be of interest to crystallographers, thermal analysts, materials scientists, physicists, chemists, chemical engineers, and electrical engineers.

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From the Back Cover

X–Ray Diffraction at Elevated Temperatures A Method for in Situ Process Analysis D. D. L. Chung P.W. DeHaven H. Arnold Debashis Ghosh This book offers a comprehensive treatment of the principles, instrumentation, and applications of x–ray diffraction at elevated temperatures. Coverage explores the uses of intense x–ray sources and position–sensitive detectors for assessing these sources, and offers comparisons with complementary thermal analysis techniques (differential scanning calorimetry, thermogravimetric analysis, thermal mechanical analysis). It describes phase identification, texture analysis, and grain size measurement by way of the in situ process analysis at elevated temperatures. It promotes the use of x–ray diffraction at elevated temperatures in a broad range of fields, including crystallography, thermal analysis, materials science, and chemical and electrical engineering.

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9780895737458: X-ray diffraction at elevated temperatures: A method for in situ process analysis

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ISBN 10:  0895737450 ISBN 13:  9780895737458
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