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Synopsis
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
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About the Author
Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal
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Spacer Engineered FinFET Architectures : High-Performance Digital Circuit Applications
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Spacer Engineered FinFET Architectures High-Performance Digital Circuit Applications
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Spacer Engineered FinFET Architectures
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Condition: New. Brajesh Kumar Kaushik received Ph.D. degree in 2007 from Indian Institute of Technology Roorkee, India. He served Vinytics Peripherals Pvt. Ltd., Delhi, as Research and Development Engineer in microprocessor, microcontroller, and DSP (Di. Seller Inventory # 869724880
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