The Source/Drain Engineering of Nanoscale Germanium-based MOS Devices (Springer Theses) [Hardcover] Li, Zhiqiang
Language: English
Published by Springer, 2016
- First Edition
- Hardcover
- Used
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- Title
- The Source/Drain Engineering of Nanoscale Germanium-based MOS Devices (Springer Theses) [Hardcover] Li, Zhiqiang
- Author
- Li, Zhiqiang
- Publisher
- Springer
- Publication year
- 2016
- Condition
- As New
- Binding
- Hardcover
- Language
- English
- ISBN 10
- 366249681X
- ISBN 13
- 9783662496817
- Edition
- 1. Auflage
- Series
- Book 107 of 797: Springer Theses
"Synopsis" may belong to another edition of this title.
About the Author
Dr. Li received his Bachelor degree of Science from Sichuan University in 2009, and Ph.D from Peking University in 2014
Prizes and awards:
2009-2014, Peking University
Leo KoGuan Scholarship, Chenming Hu Scholarship, Merit Student, Creative Talent Award.
2005-2009, Sichuan University
National Scholarship (twice), National Encouragement Scholarship, Xinyuan Scholarship (twice),
Comprehensive First-class Scholarship, Excellent Student Leader.
Publications:
1. Zhiqiang Li, Xia An, Min Li, Quanxin Yun, Meng Lin, Ming Li, Xing Zhang, and Ru Huang, “Low Electron Schottky Barrier Height of NiGe/Ge Achieved by Ion-Implantation after Germanidation Technique,” IEEE Electron Device Lett.,vol. 33, no. 12, pp. 1687–1689, Dec. 2012.
2. Zhiqiang Li, Xia An, Min Li, Quanxin Yun, Meng Lin, Ming Li, Xing Zhang, and Ru Huang, “Morphology and Electrical Performance Improvement of NiGe/Ge Contact by P and Sb Co-implantation,” IEEE Electron Device Lett., vol. 34, no. 5, pp. 596–598, May. 2013.
3. Zhiqiang Li, Xia An, Quanxin Yun, Meng Lin, Min Li, Ming Li, Xing Zhang, and Ru Huang, “Low Specific Contact Resistivity to n-Ge and Well-Behaved Ge n⁺/p Diode Achieved by Multiple Implantation and Multiple Annealing Technique,” IEEE Electron Device Lett., vol. 34, no. 9, pp. 1097–1099, Sep. 2013.
4. Zhiqiang Li, Xia An, Quanxin Yun, Meng Lin, Xing Zhang and Ru Huang, “Tuning Schottky Barrier Height in Metal/n-Type Germanium by Inserting an Ultrathin Yttrium Oxide Film,” ECS Solid State Lett., Vol. 1, no. 4, pp. Q33-Q34, 2012.
5. Zhiqiang Li, Xia An, Min Li, Quanxin Yun, Meng Lin, Ming Li, Xing Zhang, and Ru Huang, “Study on Schottky Barrier Modulation of NiGe/Ge by Ion-implantation after Germanidation Technique,” The 11th ICSICT, Xi’an, 2012.
"About the title" may belong to another edition of this title.
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