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Defect Recognition and Image Processing in III-V Compounds. Materials Science Monographs. No. 31
Seller: Zubal-Books, Since 1961, Cleveland, OH, U.S.A.
Seller rating 5 out of 5 stars
Condition: Very Good. hardcover, 306 pp., ex library, but text and binding still clean and tight . - If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country.
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Defect Recognition and Image Processing in III-V Compounds: International Symposium Proceedings
Language: English
Published by Elsevier Science Ltd, 1985
ISBN 10: 0444425586 ISBN 13: 9780444425584
£ 3.11 10% off£ 2.80
£ 14.32 shipping
Ships from France to U.S.A.Quantity: 1 available
Add to basketHardcover. Condition: Bon. Ancien livre de bibliothèque. Traces d'usure sur la couverture. Couverture différente. Edition 1985. Ammareal reverse jusqu'à 15% du prix net de cet article à des organisations caritatives. ENGLISH DESCRIPTION Book Condition: Used, Good. Former library book. Signs of wear on the cover. Different cover. Edition 1985. Ammareal gives back up to 15% of this item's net price to charity organizations.
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Hardcover. Condition: Very Good. Professional book dealer with storefront since 1975. All orders are processed promptly and carefully packaged. ; 524 pages.
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Weld seam image processing and intelligent defect recognition(Chinese Edition)
Language: English
Published by Wuhan University Press, 2024
ISBN 10: 7307242877 ISBN 13: 9787307242876
paperback. Condition: New. Language:Chinese.Paperback. Pub Date: 2024-02 Pages: 191 Publisher: Wuhan University Press This book addresses the practical problems and needs encountered in the radiographic inspection of welds in important fields such as nuclear power. chemical industry. and shipbuilding. Using digitized radiographic images of weld seams as the research object. it solves problems such as automatic defect identification. image enhancement based on human vision. digital storage and retrieval of radiographic .
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Defect Recognition and Image Processing in III-V Compounds, II: Proceedings of the Second International Symposium on Defect Recognition and Image Processing . 27-29, 1987 (Materials science monographs)
Seller: Zubal-Books, Since 1961, Cleveland, OH, U.S.A.
Seller rating 5 out of 5 stars
Condition: Good. 320 pp., hardcover, ex library else text clean and binding tight. - If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country. Photos available upon request.
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Defect Recognition and Image Processing in Semiconductors 1997 : Proceedings of the 7th International Conference on Defect Recognition and Image Processing in Semiconductors (Drip Vii) Held in Templin, Germany, 7-10
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
Condition: New.
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Defect Recognition and Image Processing in Semiconductors 1997: Proceedings of the seventh conference on Defect Recognition and Image Processing, . 160 (Institute of Physics Conference Series)
Language: English
Published by CRC Press 1998-01-01, 1998
ISBN 10: 0750305002 ISBN 13: 9780750305006
Hardcover. Condition: New.
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Defect Recognition and Image Processing in Semiconductors 1997 : Proceedings of the 7th International Conference on Defect Recognition and Image Processing in Semiconductors (Drip Vii) Held in Templin, Germany, 7-10
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
Condition: As New. Unread book in perfect condition.
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Defect Recognition and Image Processing in Semiconductors 1997
Language: English
Published by Taylor & Francis Group, 1998
ISBN 10: 0750305002 ISBN 13: 9780750305006
Condition: New. pp. 548.
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Defect Recognition and Image Processing in Semiconductors 1997: Proceedings of the seventh conference on Defect Recognition and Image Processing, ... 1997 (Institute of Physics Conference Series)
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Seller rating 5 out of 5 stars
£ 353.34
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Add to basketCondition: New. In.
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Defect Recognition and Image Processing in Semiconductors 1997
Language: English
Published by Taylor & Francis Group, 1998
ISBN 10: 0750305002 ISBN 13: 9780750305006
Condition: New. pp. 548.
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Defect Recognition and Image Processing in Semiconductors 1997: Proceedings of the 7th International Conference on Defect Recognition and Image Processing in Semiconductors (Drip Vii) Held in Templin, Germany, 7-10
Language: English
Published by Inst of Physics Pub Inc, 1998
ISBN 10: 0750305002 ISBN 13: 9780750305006
Hardcover. Condition: Brand New. 1st edition. 524 pages. 9.75x6.50x1.25 inches. In Stock.
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Gebunden. Condition: New. Dieser Artikel ist ein Print on Demand Artikel und wird nach Ihrer Bestellung fuer Sie gedruckt. Doneker, J.Defect Recognition and Image Processing in Semiconductors 1997 provides a valuable overview of current techniques used to assess, monitor, and characterize defects from the atomic scale to inhomogeneities in complete silicon wafers. This .
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Defect Recognition and Image Processing in Semiconductors 1997
Language: English
Published by Taylor & Francis Group, 1998
ISBN 10: 0750305002 ISBN 13: 9780750305006
Condition: New. pp. 548 52:B&W 6.14 x 9.21in or 234 x 156mm (Royal 8vo) Case Laminate on White w/Gloss Lam This item is printed on demand.
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Defect Recognition and Image Processing in Semiconductors 1997
Seller: PBShop.store UK, Fairford, GLOS, United Kingdom
Seller rating 5 out of 5 stars
£ 354.23
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Ships from United Kingdom to U.S.A.Quantity: Over 20 available
Add to basketHRD. Condition: New. New Book. Delivered from our UK warehouse in 4 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.
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HRD. Condition: New. New Book. Shipped from UK. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000.
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Buch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - Defect Recognition and Image Processing in Semiconductors 1997 provides a valuable overview of current techniques used to assess, monitor, and characterize defects from the atomic scale to inhomogeneities in complete silicon wafers. This volume addresses advances in defect analyzing techniques and instrumentation and their application to substrates, epilayers, and devices. The book discusses the merits and limits of characterization techniques; standardization; correlations between defects and device performance, including degradation and failure analysis; and the adaptation and application of standard characterization techniques to new materials. It also examines the impressive advances made possible by the increase in the number of nanoscale scanning techniques now available. The book investigates defects in layers and devices, and examines the problems that have arisen in characterizing gallium nitride and silicon carbide.
