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DEPOSITION OF SILICON BY ELECTRON IRRADIATION OF TETRAMETHYLSILANE
Language: English
Published by J Applied Physics, 1969
Magazine / Periodical
Pamphlet. Condition: Very Good. Vol 40, No 7, pp. 2958-2964, Illus, 4to, Extracted from orig vol, begins with title page, trimmed & stapled, thus is like a pamphlet, VG.
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Hardcover. Condition: Very Good. Hardcover; Volume 29 only; proceedings of the 34th annual conference on Applications of X-Ray Analysis, held August 5-9, 1985, in Snowmass, Colorado; light fading and shelf wear to exterior; light stain at top page corners; fade spots to endpapers; in very good condition with clean text, firm binding. Dust jacket shows scuffing, light soiling, and a few small edge tears.
