X-Ray Metrology in Semiconductor Manufacturing

Language: English

Published by Taylor and Francis Inc, US, 2006

0849339286 / 9780849339288

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Seller: Rarewaves.com UK, London, United KingdomRarewaves.com UK

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The scales involved in modern semiconductor manufacturing and microelectronics continue to plunge downward. Effective and accurate characterization of materials with thicknesses below a few nanometers can be achieved using x-rays. While many books are available on the theory behind x-ray metrology (XRM), X-Ray Metrology in Semiconductor Manufacturing is the first book to focus on the practical aspects of the technology and its application in device fabrication and solving new materials problems.Following a general overview of the field, the first section of the book is organized by application and outlines the techniques that are best suited to each. The next section delves into the techniques and theory behind the applications, such as specular x-ray reflectivity, diffraction imaging, and defect mapping. Finally, the third section provides technological details of each technique, answering questions commonly encountered in practice. The authors supply real examples from the semiconductor and magnetic recording industries as well as more than 150 clearly drawn figures to illustrate the discussion. They also summarize the principles and key information about each method with inset boxes found throughout the text.Written by world leaders in the field, X-Ray Metrology in Semiconductor Manufacturing provides real solutions with a focus on accuracy, repeatability, and throughput.…

Seller Inventory # LU-9780849339288

Title
X-Ray Metrology in Semiconductor Manufacturing
Author
D. Keith Bowen, Brian K. Tanner
Publisher
Taylor and Francis Inc, US
Publication year
2006
Condition
New
Binding
Hardback
Language
English
ISBN 10
0849339286
ISBN 13
9780849339288
Item weight
544 grams

Rarewaves.com UK

London, United Kingdom

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