Tantalum Oxide Thin Films for Embedded Capacitors : Using Pulsed DC Reactive Sputtering

Language: English

Published by VDM Verlag Dr. Müller, VDM Verlag Dr. Müller E.K., 2008

3639096622 / 9783639096620

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Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH

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Neuware - Embedded capacitor technology, where thin filmcapacitors are integrated at on-chip and/or off-chiplevels, offers high packaging densities and improvedelectrical performance at potentially reduced costsof capacitor fabrication and integration. Thisresearch explores and establishes the leverages ofusing thin film embedded capacitors over currentlyused surface mount discrete capacitors. Inparticular, this work focuses on developing pulseddc reactively sputtered tantalum oxide (Ta2O5) thinfilm capacitors for IC chips and packages. A designspace for breakdown voltage and capacitance densityof planar capacitors is established, with filmthickness and material dielectric constant asparameters. The validity of the developed designspace is experimentally verified with Ta2O5 thinfilms over a wide range of film thickness. Anexperimentally verified analytical model for pulseddc reactive sputtering of Ta2O5 films is describedand evaluated. Various processing and integrationchallenges in depositing thin films using reactivesputtering and their effects on electricalperformance of thin-film capacitors are discussed.…

Seller Inventory # 9783639096620

Title
Tantalum Oxide Thin Films for Embedded Capacitors : Using Pulsed DC Reactive Sputtering
Author
Pushkar Jain
Publisher
VDM Verlag Dr. Müller, VDM Verlag Dr. Müller E.K.
Publication year
2008
Condition
Neu
Binding
Taschenbuch
Language
English
ISBN 10
3639096622
ISBN 13
9783639096620
Item weight
334 grams
Dimensions
220x150x13 mm

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