Silicide Technology for Integrated Circuits (Hardcover)
Language: English
Published by Institution of Engineering and Technology, Stevenage, 2004
- Hardcover
- New
Seller: Grand Eagle Retail, Bensenville, IL, U.S.A.Grand Eagle Retail
AbeBooks seller since October 12, 2005
Condition: New
£ 134.24
Quantity: 1 available
Add to basketItem description from seller
Hardcover. Silicide Technology for Integrated Circuits focuses on the task of developing and applying metal silicide technology as it emerges from the scientific to the prototype and manufacturing stages and provides guidance on the application of the latest emerging technology.The book begins with an overview of silicide technology and moves on to provide the fundamentals of silicide formation, including various processing methods. Topics such as the optical emission properties of Fe silicide and their importance for Si-based optoelectronics are discussed, along with Si-Ge and SOI, which represent two possible substrate frames for the next-generation of Si-based device technology. This invaluable publication also provides comprehensive coverage of the characterisation methods used in silicide technology. Silicide Technology for Integrated Circuits focuses on the task of developing and applying metal silicide technology as it emerges from the scientific to the prototype and manufacturing stages and provides guidance on the application of the latest emerging technology. Shipping may be from multiple locations in the US or from the UK, depending on stock availability.…
Seller Inventory # 9780863413520
- Title
- Silicide Technology for Integrated Circuits (Hardcover)
- Author
- Lih J. Chen
- Publisher
- Institution of Engineering and Technology, Stevenage
- Publication year
- 2004
- Condition
- new
- Binding
- Hardcover
- Language
- English
- ISBN 10
- 0863413528
- ISBN 13
- 9780863413520
Silicide Technology for Integrated Circuits focuses on the task of developing and applying metal silicide technology as it emerges from the scientific to the prototype and manufacturing stages and provides guidance on the application of the latest emerging technology.
The book begins with an overview of silicide technology and moves on to provide the fundamentals of silicide formation, including various processing methods. Topics such as the optical emission properties of Fe silicide and their importance for Si-based optoelectronics are discussed, along with Si-Ge and SOI, which represent two possible substrate frames for the next-generation of Si-based device technology. This invaluable publication also provides comprehensive coverage of the characterisation methods used in silicide technology.
"Synopsis" may belong to another edition of this title.
About the Author
Professor Chen received his PhD in physics from UC Berkeley in 1974. He became a faculty member in the Department of Materials Science and Engineering, National Tsing Hua University in 1977. He is currently the Dean, College of Engineering and Chair Professor, Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu, Taiwan. Professor Chen has conducted extensive research on integrated circuits thin film materials for almost three decades. His current research interests include interfacial reaction of metal thin films on silicon and Si-Ge alloys, advanced metallisation in integrated circuits as well as nanostructured materials.
"About the title" may belong to another edition of this title.
Grand Eagle Retail
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AbeBooks seller since October 12, 2005
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