Plasma Surface Processing and Thin Film Engineering (Paperback)
Language: English
Published by Independently Published, 2026
- Softcover
- New

Seller: CitiRetail, Stevenage, United KingdomCitiRetail
AbeBooks seller since June 29, 2022
Condition: New
£ 19.99
Quantity: 1 available
Add to basketItem description from seller
Paperback. Plasma-enabled surface engineering is a practical guide for readers who want to turn plasma science into reliable coating, cleaning, and functionalization results. It brings together the key principles, hardware, materials, and process controls needed to design and run surface treatment workflows for metals, polymers, ceramics, glass, composites, and advanced industrial components.The book starts with the physics of plasma and its interaction with surfaces, then moves into source design, vacuum systems, gas handling, diagnostics, and bias control. From there, it shows how plasma pretreatment improves adhesion, how deposition methods build high-value thin films, and how film composition, ion energy, and microstructure shape final performance.What this book coversPlasma fundamentals, species behavior, surface chemistry, and interfacial reaction pathwaysProcess hardware, including RF, microwave, and DC systems, chambers, pumping, and diagnosticsSurface preparation for cleaning, activation, roughness control, and surface energy tuningThin film deposition through sputtering, PECVD, and plasma-assisted ALDFilm engineering for metals, oxides, nitrides, carbides, multilayers, and doped coatingsMicrostructure control using ion energy, flux, substrate bias, and thermal effectsFunctional surfaces with tailored wettability, antimicrobial response, and improved bondingQuality assurance, metrology, defect detection, and recipe documentationPerformance testing for wear, corrosion, adhesion, nanoindentation, and failure analysisTroubleshooting and optimization using root cause methods and design of experimentsEach chapter builds toward real process decisions, helping readers connect plasma settings to coating thickness, uniformity, composition, stress, durability, and interface integrity. The final sections also address safe operation, contamination control, maintenance, and best practices for stable production.Ideal for engineers, researchers, process developers, and advanced students working in surface modification, thin film technology, materials processing, and industrial plasma systems. It is especially useful for teams that need both scientific understanding and hands-on guidance for dependable results. This item is printed on demand. Shipping may be from our UK warehouse or from our Australian or US warehouses, depending on stock availability. …
Seller Inventory # 9798197395061
- Title
- Plasma Surface Processing and Thin Film Engineering (Paperback)
- Author
- Silvan Merrick
- Publisher
- Independently Published
- Publication year
- 2026
- Condition
- new
- Binding
- Paperback
- Language
- English
- ISBN 13
- 9798197395061
Plasma-enabled surface engineering is a practical guide for readers who want to turn plasma science into reliable coating, cleaning, and functionalization results. It brings together the key principles, hardware, materials, and process controls needed to design and run surface treatment workflows for metals, polymers, ceramics, glass, composites, and advanced industrial components.
The book starts with the physics of plasma and its interaction with surfaces, then moves into source design, vacuum systems, gas handling, diagnostics, and bias control. From there, it shows how plasma pretreatment improves adhesion, how deposition methods build high-value thin films, and how film composition, ion energy, and microstructure shape final performance.
What this book covers
- Plasma fundamentals, species behavior, surface chemistry, and interfacial reaction pathways
- Process hardware, including RF, microwave, and DC systems, chambers, pumping, and diagnostics
- Surface preparation for cleaning, activation, roughness control, and surface energy tuning
- Thin film deposition through sputtering, PECVD, and plasma-assisted ALD
- Film engineering for metals, oxides, nitrides, carbides, multilayers, and doped coatings
- Microstructure control using ion energy, flux, substrate bias, and thermal effects
- Functional surfaces with tailored wettability, antimicrobial response, and improved bonding
- Quality assurance, metrology, defect detection, and recipe documentation
- Performance testing for wear, corrosion, adhesion, nanoindentation, and failure analysis
- Troubleshooting and optimization using root cause methods and design of experiments
Each chapter builds toward real process decisions, helping readers connect plasma settings to coating thickness, uniformity, composition, stress, durability, and interface integrity. The final sections also address safe operation, contamination control, maintenance, and best practices for stable production.
Ideal for engineers, researchers, process developers, and advanced students working in surface modification, thin film technology, materials processing, and industrial plasma systems. It is especially useful for teams that need both scientific understanding and hands-on guidance for dependable results.
"Synopsis" may belong to another edition of this title.
CitiRetail
Stevenage, United Kingdom
AbeBooks seller since June 29, 2022
Shipping rates from United Kingdom to U.S.A.
| Item | 7 to 14 business days | 7 to 60 business days |
|---|---|---|
| First item | £ 37.00 | £ 37.00 |
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