Plasma Surface Processing and Thin Film Engineering : Enhancing Material Performance Through Plasma Coating, Thin Film Deposition, and Surface Functionalization Technologies
Language: English
Published by Independently Published Mai 2026, 2026
- Softcover
- New
Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH
AbeBooks seller since August 14, 2006
Condition: New
£ 29.26
Quantity: 2 available
Add to basketItem description from seller
Neuware - Plasma-enabled surface engineering is a practical guide for readers who want to turn plasma science into reliable coating, cleaning, and functionalization results. It brings together the key principles, hardware, materials, and process controls needed to design and run surface treatment workflows for metals, polymers, ceramics, glass, composites, and advanced industrial components.The book starts with the physics of plasma and its interaction with surfaces, then moves into source design, vacuum systems, gas handling, diagnostics, and bias control. From there, it shows how plasma pretreatment improves adhesion, how deposition methods build high-value thin films, and how film composition, ion energy, and microstructure shape final performance.What this book covers- Plasma fundamentals, species behavior, surface chemistry, and interfacial reaction pathways- Process hardware, including RF, microwave, and DC systems, chambers, pumping, and diagnostics- Surface preparation for cleaning, activation, roughness control, and surface energy tuning- Thin film deposition through sputtering, PECVD, and plasma-assisted ALD- Film engineering for metals, oxides, nitrides, carbides, multilayers, and doped coatings- Microstructure control using ion energy, flux, substrate bias, and thermal effects- Functional surfaces with tailored wettability, antimicrobial response, and improved bonding- Quality assurance, metrology, defect detection, and recipe documentation- Performance testing for wear, corrosion, adhesion, nanoindentation, and failure analysis- Troubleshooting and optimization using root cause methods and design of experimentsEach chapter builds toward real process decisions, helping readers connect plasma settings to coating thickness, uniformity, composition, stress, durability, and interface integrity. The final sections also address safe operation, contamination control, maintenance, and best practices for stable production.Ideal for engineers, researchers, process developers, and advanced students working in surface modification, thin film technology, materials processing, and industrial plasma systems. It is especially useful for teams that need both scientific understanding and hands-on guidance for dependable results.…
Seller Inventory # 9798197395061
- Title
- Plasma Surface Processing and Thin Film Engineering : Enhancing Material Performance Through Plasma Coating, Thin Film Deposition, and Surface Functionalization Technologies
- Author
- Silvan Merrick
- Publisher
- Independently Published Mai 2026
- Publication year
- 2026
- Condition
- Neu
- Binding
- Taschenbuch
- Language
- English
- ISBN 13
- 9798197395061
- Item weight
- 590 grams
- Dimensions
- 279x216x13 mm
Plasma-enabled surface engineering is a practical guide for readers who want to turn plasma science into reliable coating, cleaning, and functionalization results. It brings together the key principles, hardware, materials, and process controls needed to design and run surface treatment workflows for metals, polymers, ceramics, glass, composites, and advanced industrial components.
The book starts with the physics of plasma and its interaction with surfaces, then moves into source design, vacuum systems, gas handling, diagnostics, and bias control. From there, it shows how plasma pretreatment improves adhesion, how deposition methods build high-value thin films, and how film composition, ion energy, and microstructure shape final performance.
What this book covers
- Plasma fundamentals, species behavior, surface chemistry, and interfacial reaction pathways
- Process hardware, including RF, microwave, and DC systems, chambers, pumping, and diagnostics
- Surface preparation for cleaning, activation, roughness control, and surface energy tuning
- Thin film deposition through sputtering, PECVD, and plasma-assisted ALD
- Film engineering for metals, oxides, nitrides, carbides, multilayers, and doped coatings
- Microstructure control using ion energy, flux, substrate bias, and thermal effects
- Functional surfaces with tailored wettability, antimicrobial response, and improved bonding
- Quality assurance, metrology, defect detection, and recipe documentation
- Performance testing for wear, corrosion, adhesion, nanoindentation, and failure analysis
- Troubleshooting and optimization using root cause methods and design of experiments
Each chapter builds toward real process decisions, helping readers connect plasma settings to coating thickness, uniformity, composition, stress, durability, and interface integrity. The final sections also address safe operation, contamination control, maintenance, and best practices for stable production.
Ideal for engineers, researchers, process developers, and advanced students working in surface modification, thin film technology, materials processing, and industrial plasma systems. It is especially useful for teams that need both scientific understanding and hands-on guidance for dependable results.
"Synopsis" may belong to another edition of this title.
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