Plasma Etching Processes for CMOS Devices Realization

Language: English

Published by ISTE Press - Elsevier, 2017

1785480960 / 9781785480966

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Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH

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nach der Bestellung gedruckt Neuware - Printed after ordering - Plasma etching has long enabled the perpetuation of Moore's Law. Today, etch compensation helps to create devices that are smaller than 20 nm. But, with the constant downscaling in device dimensions and the emergence of complex 3D structures (like FinFet, Nanowire and stacked nanowire at longer term) and sub 20 nm devices, plasma etching requirements have become more and more stringent.Now more than ever, plasma etch technology is used to push the limits of semiconductor device fabrication into the nanoelectronics age. This will require improvement in plasma technology (plasma sources, chamber design, etc.), new chemistries (etch gases, flows, interactions with substrates, etc.) as well as a compatibility with new patterning techniques such as multiple patterning, EUV lithography, Direct Self Assembly, ebeam lithography or nanoimprint lithography.This book presents these etch challenges and associated solutions encountered throughout the years for transistor realization.…

Seller Inventory # 9781785480966

Title
Plasma Etching Processes for CMOS Devices Realization
Author
Nicolas Posseme
Publisher
ISTE Press - Elsevier
Publication year
2017
Condition
Neu
Binding
Buch
Language
English
ISBN 10
1785480960
ISBN 13
9781785480966
Item weight
330 grams
Dimensions
229x152x10 mm

AHA-BUCH GmbH

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