Ion Implantation And Annealing Applications, Science And Technology: Contributions From Iit School, Edition 2026
Language: English
Published by Springer Nature Switzerland Ag, 2026
- Hardcover
- New
Seller: Revaluation Books, Exeter, United KingdomRevaluation Books
AbeBooks seller since January 6, 2003
Condition: New
£ 235.58
Quantity: 2 available
Add to basketItem description from seller
792 pages. 6.14x1.69x9.21 inches. In Stock.
Seller Inventory # x-3032311721
- Title
- Ion Implantation And Annealing Applications, Science And Technology: Contributions From Iit School, Edition 2026
- Author
- Current, Michael I. (Editor)/ Lerch, Wilfried (Editor)
- Publisher
- Springer Nature Switzerland Ag
- Publication year
- 2026
- Condition
- Brand New
- Binding
- Hardcover
- Language
- English
- ISBN 10
- 3032311721
- ISBN 13
- 9783032311726
- Item weight
- 1.28 kilograms
This book is a new, comprehensive, tutorial-style reference from the IIT2026 school that unifies ion implantation and annealing, guiding the reader from historical context and fundamental beam physics through to full process integration in advanced semiconductor manufacturing. It uniquely combines rigorous coverage of ion sources, beam transport, implanter and annealer hardware, and state of the art thermal processing for Si, Ge, SiC, GaN, and other materials with a practical comparison of commercial tool platforms. Dedicated materials science chapters explain implantation induced defects in key semiconductor materials, their evolution during annealing, and the diffusion and dopant activation mechanisms that ultimately determine device performance, variability, and reliability. Extensive treatments of metrology, contamination control, and safety, together with forward looking application chapters for logic, memory, image sensors, and power devices, make the volume both an ideal introduction for newcomers and an authoritative reference for experienced engineers and scientists.
"Synopsis" may belong to another edition of this title.
From the Back Cover
This book is a new, comprehensive, tutorial-style reference from the IIT2026 school that unifies ion implantation and annealing, guiding the reader from historical context and fundamental beam physics through to full process integration in advanced semiconductor manufacturing. It uniquely combines rigorous coverage of ion sources, beam transport, implanter and annealer hardware, and state of the art thermal processing for Si, Ge, SiC, GaN, and other materials with a practical comparison of commercial tool platforms. Dedicated materials science chapters explain implantation induced defects in key semiconductor materials, their evolution during annealing, and the diffusion and dopant activation mechanisms that ultimately determine device performance, variability, and reliability. Extensive treatments of metrology, contamination control, and safety, together with forward looking application chapters for logic, memory, image sensors, and power devices, make the volume both an ideal introduction for newcomers and an authoritative reference for experienced engineers and scientists.
"About the title" may belong to another edition of this title.
Revaluation Books
Exeter, United Kingdom
AbeBooks seller since January 6, 2003
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Edward Bowditch Ltd
Exstowe, Exton
Exeter, United Kingdom EX3 0PP
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