Coulomb Interactions in Particle Beams, Volume 230, the latest release in the
Advances in Imaging and Electron Physics series, merges two long-running serials,
Advances in Electronics and Electron Physics and
Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
- Provides the authority and expertise of leading contributors from an international board of authors
- Presents the latest release in the Advances in Imaging and Electron Physics series
Guus Jansen earned both his MSc (1983) and PhD (1988) in Physics from Delft University of Technology, graduating Cum Laude for both degrees. His PhD thesis on "Coulomb Interactions in Particle Beams" won the prestigious Shell Award for the best research project at Delft in 1988. This work was first published by Academic Press in 1990 in the series Advances in Electronics and Electron Physics and is being republished in 2024 in Advances in Electronics and Imaging Physics.
From 1983 to 1985, his first role after earning his MSc was as a postdoctoral researcher at IBM's General Technology Division in New York, focusing on variable-shaped beam electron lithography. After his PhD, he served as a research physicist at the Royal Dutch/Shell Laboratories in Amsterdam (1989–1992), where he led the development and modeling of refinery equipment and chemical processes.
In 1992, he transitioned into strategic consulting as a Senior Management Consultant at Monitor Company (1992–1996), advising top-tier corporations across a range of industries. In 1996, he joined Telfort, a joint venture between British Telecom and Dutch Railways (NS), as Director of Marketing & Business Development. As a member of the board, he oversaw corporate strategy, business planning and development, product development, and management.
Since 2000, Guus has operated as a serial entrepreneur through Caneval Ventures, his business development and investment company. Caneval Ventures has initiated, supported, and led multiple startups and scale-ups in the ICT and renewable energy sectors, with Guus serving as CEO, CCO, and CFO of various companies.
In 2002, Caneval Ventures acquired the IP rights for MonTec and Interac software, both of which were initially developed as part of Guus' PhD research. These software packages have been adopted by leading companies like IBM, Toshiba, Philips, and several universities and research institutions globally. Over the years, Caneval Ventures has provided consultancy to various institutions and companies, specializing in quantifying and mitigating the effects of Coulomb interactions in charged particle systems.
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.
