Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606

Language: English

Published by Cambridge University Press, GB, 2014

1107413206 / 9781107413207

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This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics.

Seller Inventory # LU-9781107413207

Title
Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606
Author
Anthony C. Jones
Publisher
Cambridge University Press, GB
Publication year
2014
Condition
New
Binding
Paperback
Language
English
ISBN 10
1107413206
ISBN 13
9781107413207
Item weight
440 grams

Rarewaves.com UK

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