Chemical Process Design and Simulation Based on Aspen Plus and Aspen HYSYS(Chinese Edition)

Language: English

Published by National Defense Industry Press, 2025

7118131970 / 9787118131970

  • Softcover
  • New
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Seller: liu xing, Nanjing, JS, Chinaliu xing

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Softcover

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Item description from seller

Language:Chinese.Paperback. Pub Date: 2025-01 Pages: 484 Publisher: National Defense Industry Press This book introduces the methods of chemical process design and simulation using AspenPlus and AspenHYSYS simulation software. It explains the principles of chemical engineering design and illustrates its application examples in the most commonly used simulation software. The book is divided into four parts: Introduction to Design and Simulation. Unit Operation Design and Simulation. and Conven.

Seller Inventory # DT049592

Title
Chemical Process Design and Simulation Based on Aspen Plus and Aspen HYSYS(Chinese Edition)
Author
ZHU MA. HAI DE RUI ( SI LUO FA KE )
Publisher
National Defense Industry Press
Publication year
2025
Condition
New
Binding
paperback
Language
English
ISBN 10
7118131970
ISBN 13
9787118131970

liu xing

Nanjing, JS, China

5-star seller

AbeBooks seller since April 7, 2009

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