Advances in Rapid Thermal and Integrated Processing

Language: English

Published by Springer Netherlands Mrz 1996, 1996

0792340116 / 9780792340119

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Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermanyBuchWeltWeit Ludwig Meier e.K.

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Hardcover

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This item is printed on demand - it takes 3-4 days longer - Neuware -Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage. 582 pp. Englisch. …

Seller Inventory # 9780792340119

Title
Advances in Rapid Thermal and Integrated Processing
Author
F. Roozeboom
Publisher
Springer Netherlands Mrz 1996
Publication year
1996
Condition
Neu
Binding
Buch
Language
English
ISBN 10
0792340116
ISBN 13
9780792340119
Item weight
1,030 grams
Dimensions
241x160x36 mm

BuchWeltWeit Ludwig Meier e.K.

Bergisch Gladbach, Germany

5-star seller

AbeBooks seller since January 11, 2012

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BuchWeltWeit Ludwig Meier e.K.

Germany