Advances in CMP Polishing Technologies

Language: English

Published by William Andrew Publishing, US, 2011

1437778593 / 9781437778595

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CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge RandD accessible to the wider engineering community. Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience. Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries.…

Seller Inventory # LU-9781437778595

Title
Advances in CMP Polishing Technologies
Author
Toshiro Doi
Publisher
William Andrew Publishing, US
Publication year
2011
Condition
New
Binding
Hardback
Language
English
ISBN 10
1437778593
ISBN 13
9781437778595
Item weight
550 grams

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