PROJECT ON Elements of Modern Physics
Ion implantation is a common technique used in the semiconductor industry for introducing dopants into a substrate to alter its electrical and physical properties. The success of this technique depends on the accurate modeling of the ion implantation process. SRIM (Stopping and Range of Ions in Matter) is a widely used simulation software for predicting ion implantation behavior in materials. In this project, we will use SRIM to simulate the ion implantation process and analyze its effects on a silicon substrate.IRADINA SOFTWARE also used for Ion implantation.
"synopsis" may belong to another edition of this title.
Seller: California Books, Miami, FL, U.S.A.
Condition: New. Print on Demand. Seller Inventory # I-9798389987968
Seller: PBShop.store UK, Fairford, GLOS, United Kingdom
PAP. Condition: New. New Book. Shipped from UK. Established seller since 2000. Seller Inventory # L2-9798389987968
Quantity: Over 20 available
Seller: Ria Christie Collections, Uxbridge, United Kingdom
Condition: New. In. Seller Inventory # ria9798389987968_new
Quantity: Over 20 available