Items related to Chemical Etching Behaviour of a Polyimide
Synopsis
Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.
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Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.
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Chemical Etching Behaviour of a Polyimide
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Chemical Etching Behaviour of a Polyimide
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Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, Molecular Physics, Solid State Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample. 28 pp. Englisch. Seller Inventory # 9783668084186
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Chemical Etching Behaviour of a Polyimide
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GRIN Verlag, GRIN Verlag Nov 2015, 2015
ISBN 10: 3668084181
ISBN 13: 9783668084186
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Taschenbuch. Condition: Neu. This item is printed on demand - Print on Demand Titel. Neuware -Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample.Books on Demand GmbH, Überseering 33, 22297 Hamburg 28 pp. Englisch. Seller Inventory # 9783668084186
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Chemical Etching Behaviour of a Polyimide
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Taschenbuch. Condition: Neu. Druck auf Anfrage Neuware - Printed after ordering - Scientific Study from the year 2009 in the subject Physics - Nuclear Physics, grade: A, , language: English, abstract: Investigations were carried out on etching behaviour of an engineering polymer Kapton-H (4-4'-oxydiphenylene pyromellitimide). Kapton-H samples were subjected to etching in 4N NaOH at 400 °C and at 500 °C temperatures in pristine as well as irradiated form. Irradiation of pristine Kapton-H specimen was done using 75 MeV/nucleon O+ ion beam of fluence 1.875 x a trillion ions/cm2. The specimen was exposed to etchant for a period of 150 minutes. The effect of etching was observed as half layer thickness removed. Thickness measurements were made at etching cycles of 15 minutes each. It was observed that temperature and the irradiation has their effect on etching behaviour of Kapton-H. Study showed that the temperature results in the increased average bulk etch rate. The average bulk etch rate was also observed to increase with the irradiation of the sample. Seller Inventory # 9783668084186
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Chemical Etching Behaviour of a Polyimide
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Taschenbuch. Condition: Neu. Chemical Etching Behaviour of a Polyimide | Deep Shikha | Taschenbuch | 28 S. | Englisch | 2015 | GRIN Verlag | EAN 9783668084186 | Verantwortliche Person für die EU: GRIN Publishing GmbH, Waltherstr. 23, 80337 München, info[at]grin[dot]com | Anbieter: preigu Print on Demand. Seller Inventory # 104127984