Materials Processing Using Plasma Focus: Plasma Characterization and Processing of Industrial Materials - Softcover

Hassan, Muhammad

Softcover

ISBN 10: 3639276639 ISBN 13: 9783639276633

Publisher: VDM Verlag Dr. Müller, 2010

Synopsis

The present research work reports the parametric study of ion beams emitted from two different Mather type plasma focus devices and their utilization in materials processing. Experiments have been conducted by using a conventional 2.3 kJ UNU/ICTP plasma focus device and the NX2 device (a repetitive plasma focus). The ion parameters such as energy, energy distribution, number density and current density are evaluated in the ambient gas pressure by employing a BPX65 photodiode and a Faraday cup (FC) using time of flight technique. A major motivation is to establish the optimum processing conditions for ion nitriding, surface modification, phase changes and carburizing of materials of industrial interest like Ti, AlFe1.8Zn0.8 alloy and SS-321 in plasma environment. The processed samples are characterized for structural and morphological changes, compositional profile and surface hardness by employing XRD, SEM FESEM, EDX, XPS, Raman spectroscopy and Vickers microhardness test. The SRIM code and microindentation measurements are used to estimate the depth profile of the modified layers.

About this title

About the Author

Dr. Muhammad Hassan did M.Sc from IUB, M.Phil from QAU Islamabad and Ph.D from GCU Lahore. He served as Lecturer at GCU and has been Research Fellow for PAEC, PCST and NESCOM projects. He has been visiting Researcher at NTU Singapore, in 2006 and 2007. He is author of 13 research papers. His research interests are plasma processing of materials.

Edition details

• Publisher: VDM Verlag Dr. Müller
• Publication date: 2010
• Language: English
• ISBN 10: 3639276639
• ISBN 13: 9783639276633
• Binding: Paperback
• Number of pages: 168