Introduction to Accumark, Pattern Design, and Pdm - Softcover

Sharp, Julia

 
9781563674372: Introduction to Accumark, Pattern Design, and Pdm

Synopsis

Introduction to AccuMark, Pattern Design, and Product Data Management provides step-by-step instructions to Gerber Technology's in-demand software programs. AccuMark, used to copy patterns into the computer, is covered from the basics of data storage and retrieval to the complexities of digitization. The Pattern Design section details the sizing and measuring, point and notch, line, and piece functions necessary to translate creativity into pattern reality. Rounding out the book are instructions in Product Data Management (Pdm), including design and cost specifications. Together, these three computer aided design (Cad) programs are the industry standard. This clear, user-friendly book is the companion tool students need to master them, and to maximize their technological savvy in today's dynamic fashion industry.

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About the Authors

Julia Sharp, a retired Assistant Professor of Fashion at Centenary University, taught courses in textiles, fashion, costume design, and digital garment design. She also designs costumes for professional and community theaters. Her fashion work has been featured at conferences of the International Textile and Apparel Association, where she has also presented on experiential learning, and innovative teaching techniques. Sharp is co-author of Textiles: Concepts and Principles, 4e; Design Basics for Apparel; Introduction to AccuMark, Pattern Design, and Product Data Management; and Know Your Home Furnishings, 2e; and she contributed to The Fabric of Cultures exhibition and catalog, and to the Encyclopedia of Clothing and Fashion.

Virginia Hencken Elsasser, retired associate professor in the Centenary College (now Centenary University) fashion program, taught classes in textiles, design, and the behavioral aspects of clothing. She has co-authored four books: Know Your Home Furnishings, 2e; Textiles: Concepts and Principles, 4e; Introduction to AccuMark, Pattern Design, and Product Data Management; and Design Basics for Apparel. Her presentations at professional conferences included topics related to creative learning activities in the classroom, innovative teaching techniques, and the use of computers in fashion. As director of the Centenary Honors Program, she conducted
numerous overseas study tours.

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