Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.
"synopsis" may belong to another edition of this title.
Seller: J. HOOD, BOOKSELLERS, ABAA/ILAB, Baldwin City, KS, U.S.A.
Hardcover. 571pp. Very good plus condition with text clean & binding tight but without dust jacket. Seller Inventory # 157414
Seller: Buchpark, Trebbin, Germany
Condition: Sehr gut. Zustand: Sehr gut | Seiten: 554 | Sprache: Englisch | Produktart: Bücher | Keine Beschreibung verfügbar. Seller Inventory # 36116527/202