Synopsis
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
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Optical Imaging in Projection Microlithography
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Optical Imaging in Projection Microlithography (SPIE Tutorial Texts in Optical Engineering Vol. TT66)
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Society of Photo Optical, 2005
ISBN 10: 0819458295
ISBN 13: 9780819458292
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Optical Imaging in Projection Microlithography (SPIE Tutorial Texts in Optical Engineering Vol. TT66)
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Condition: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective. Series: Tutorial Texts. Num Pages: 276 pages, Illustrations. BIC Classification: TJFC; TTB. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 253 x 181 x 18. Weight in Grams: 662. . 2005. illustrated edition. Paperback. . . . . Seller Inventory # V9780819458292
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Optical Imaging in Projection Microlithography
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SPIE - International Society for Optical Engineering, 2005
ISBN 10: 0819458295
ISBN 13: 9780819458292
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Paperback. Condition: New. illustrated Edition. Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists. Seller Inventory # LU-9780819458292
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Optical Imaging in Projection Microlithography (SPIE Tutorial Texts in Optical Engineering Vol. TT66)
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Condition: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can gather concepts and the equations that result. The casual reader will gain a perspective. Series: Tutorial Texts. Num Pages: 276 pages, Illustrations. BIC Classification: TJFC; TTB. Category: (P) Professional & Vocational; (UP) Postgraduate, Research & Scholarly. Dimension: 253 x 181 x 18. Weight in Grams: 662. . 2005. illustrated edition. Paperback. . . . . Books ship from the US and Ireland. Seller Inventory # V9780819458292
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Optical Imaging in Projection Microlithography
Published by
SPIE - International Society for Optical Engineering, 2005
ISBN 10: 0819458295
ISBN 13: 9780819458292
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Einband - flex.(Paperback). Condition: New. An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge of calculus can follow the development, technologists can . Seller Inventory # 2146021731
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Optical Imaging in Projection Microlithography
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Paperback. Condition: New. illustrated Edition. Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists. Seller Inventory # LU-9780819458292
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