The dynamic field of lithography demands an authoritative handbook for process development and production and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook.
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This first of two volumes covers microlithography, focusing on applications of microlithography techniques in microelectronics manufacturing. Coverage includes optical lithography, electron beam lithography, deep-UV resist technology, X-ray lithography, photomask fabrication procedures and limitations, metrology methods in photolithography, optical
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