Synopsis
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
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Review
Presents an extensive, comprehensive study of chemical vapor deposition (CVD).
"About this title" may belong to another edition of this title.
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Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology Series)
Seller: HPB-Diamond, Dallas, TX, U.S.A.
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hardcover. Condition: Very Good. Connecting readers with great books since 1972! Used books may not include companion materials, and may have some shelf wear or limited writing. We ship orders daily and Customer Service is our top priority! Seller Inventory # S_427461204
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Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications
Published by
Noyes Pubns, (1987)., Parkdridge, New Jersey, U.S.A., 1987
ISBN 10: 0815511361
ISBN 13: 9780815511366
Used
Hardcover
Seller: Pride and Prejudice-Books, Ballston Lake, NY, U.S.A.
Seller rating 5 out of 5 stars
Hardcover. Condition: Near Fine. Second Printing. Original blue cloth. Previous owner's name in ink, Near Fine. No Dust Jacket. Seller Inventory # 018428