Items related to Applications of Plasma Processes to V.L.S.I.Technology
Synopsis
This book presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, the book provides considerable insight into Japan's technological effort in this important area of science. Focused on research involving plasma deposition and dry etching, considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.
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- PublisherWiley–Blackwell
- Publication date1985
- ISBN 10 0471869600
- ISBN 13 9780471869603
- BindingHardcover
- Number of pages394
- EditorSugano Takuo
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Applications of Plasma Processes to VLSI Technology Sugano, Takuo
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Condition: Used: Acceptable. 1985 hardcover no dj xlibrary copy withdrawn stamp on edge of pages/ in book clean text has age spots has book plate and card pocket 394 pages::: H-10. Seller Inventory # 0611IZ6DHVJ
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Applications of Plasma Processes to Vlsi Technology
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Applications of Plasma Processes to VLSI Technology
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Hardcover. Condition: Good. No Jacket. Former library book; Pages can have notes/highlighting. Spine may show signs of wear. ~ ThriftBooks: Read More, Spend Less 1.65. Seller Inventory # G0471869600I3N10
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Applications of Plasma Processes to VLSI Technology
Published by
John Wiley & Sons, New York, 1985
ISBN 10: 0471869600
ISBN 13: 9780471869603
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Hard Cover. First English Language Edition. Hard blue covers, content is as new, ex library copy with usual stamps and labels, no pocket and no external markings, otherwise a fine copy, pp xiv,394. Text figures and diagrams throughout. Size: 16x24cm. Seller Inventory # 005143
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Applications of Plasma Processes to VLSI Technology
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