Ion Implantation - Hardcover

Ryssel, Heiner; Ingolf, Ruge

Hardcover

ISBN 10: 047110311X ISBN 13: 9780471103110

Publisher: Wiley–Blackwell, 1986

Synopsis

In contrast to the majority of books on ion implantation, which are directed at specialists, this book is written for industrial and research engineers who use ion implantation as a tool to dope semiconductors and change material properties. Therefore, the authors stress the practical problems involved rather than the theoretical background, covering such topics as defects, thermal annealing, laser annealing and apparatus. The main emphasis of the book is on techniques. After a short description of the theoretical background, the authors concentrate on the various practical matters arising during the use of ion implantation, such as the electrical activation of implanted ions and diffusion effects. Standard measurement methods and requirements for accelerators are discussed and many examples of the uses of ion implantation are given.

Edition details

• Publisher: Wiley–Blackwell
• Publication date: 1986
• Language: English
• ISBN 10: 047110311X
• ISBN 13: 9780471103110
• Binding: Hardcover
• Number of pages: 478